Comment amtetcher SNF 2008-11-24 12:59:59: Oxide Etch rate decreased
jsuarez at snf.stanford.edu
jsuarez at snf.stanford.edu
Mon Nov 24 13:00:00 PST 2008
Program 3 (total etch time = 3.0 min)
RF at 2.9 min = 1066/1036 W
RF at 1.5 min = 1035/1008 W
RF at 0.8 sec = 1025/996 W
Etch rate = 275A/min
More information about the amtetcher-pcs
mailing list