Comment amtetcher SNF 2008-11-24 12:59:59: Oxide Etch rate decreased

jsuarez at snf.stanford.edu jsuarez at snf.stanford.edu
Mon Nov 24 13:00:00 PST 2008


Program 3 (total etch time = 3.0 min)
RF at 2.9 min = 1066/1036 W
RF at 1.5 min = 1035/1008 W
RF at 0.8 sec =  1025/996 W
Etch rate = 275A/min




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