Comment amtetcher SNF 2011-01-20 21:59:35: Quals part 1

mtang at snf.stanford.edu mtang at snf.stanford.edu
Thu Jan 20 21:59:36 PST 2011


Ran part of the quals for recipe #3, as per wiki procedures.
Thermal oxide etch rate = 353 A/min
Within wafer nonuniformity = 4.1%
Across the load total nonuniformity = 4.4%
Resist etch rate = 67 A/min
More to come.




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