Problem amtetcher SNF 2011-09-10 09:38:46: Process 2 uses NF3 bottle too- consequences

quickwin at snf.stanford.edu quickwin at snf.stanford.edu
Sat Sep 10 09:38:47 PDT 2011


Yesterday my etch rate was low - around 245A/min.  I wonder if this is caused by the excessive buildup of polymer in the chamber.  NF3 is a necessary gas for process 2, the chamber cleaning recipe.  Now that NF3 is low,  process 2 is probably affected, therefore the efficiency of polymer removal.  




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