Drytek2 status 8/14/00

Jim McVittie mcvittie at cis.Stanford.EDU
Mon Aug 14 16:50:19 PDT 2000

Ammtetcher Users,

With Drytek2 being down, I suggest that you use the Matrix for your post
oxide etch cleanup before your H2SO4/H2O2 wet resist strip. I have found
that the first 15 seconds of the standard Matrix process is sufficent to
make the H2SO4/H2O2 strip work correctly. I usually just run the standard
process in the single wafer mode and use the abort bottom to stop after
the 15s initiation period. 

James P. McVittie, Ph.D.                Senior Research Scientist
Rm. 336            			jmcvittie at stanford.edu
Allen Center for Integrated Systems	Tel: (650) 725-3640	
Stanford University			Fax: (650) 723-4659
330 Serra Mall		  For packages: CISX Receiving
Stanford, CA 94305-4075			Via Ortega
					Stanford, CA 94305-4075

On Mon, 14 Aug 2000, Len Booth wrote:

> Users -
> 	The electrode chiller is not working at all.
> The machine will be shutdown until we get it fixed.
> 			Len

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