From fengj at stanford.edu Fri Sep 14 22:09:00 2007 From: fengj at stanford.edu (fengj at stanford.edu) Date: Fri, 14 Sep 2007 22:09:00 -0700 Subject: Please Don't Change the Standard Recipes Message-ID: <20070914220900.3q160f0z4o0ss0wo@webmail.stanford.edu> Dear Users: I just found that recipe #3 for oxide etch had been changed. The DC bias was -450V instead of -530V. A lot of users are using this recipe to etch oxide, and they have done numerous runs to calibrate the etch rate as well as the anisotripy. The change in DC bias (as well as some other parameters) can affect the etch rate and profile significantly. It is the policy of this etcher that the users can only change the etch time of recipes #1, 3, and 4. If you want to make any other changes, you can copy the recipe into #5 and then do whatever you want to #5. Thanks, Jia From joshuar at stanford.edu Tue Sep 18 11:23:27 2007 From: joshuar at stanford.edu (Josh Ratchford) Date: Tue, 18 Sep 2007 11:23:27 -0700 Subject: 1 pm reservation removed Message-ID: -------------- next part -------------- An HTML attachment was scrubbed... URL: