Please Don't Change the Standard Recipes

[fengj at stanford.edu]

Dear Users:

I just found that recipe #3 for oxide etch had been changed. The DC  
bias was -450V instead of -530V. A lot of users are using this recipe  
to etch oxide, and they have done numerous runs to calibrate the etch  
rate as well as the anisotripy. The change in DC bias (as well as some  
other parameters) can affect the etch rate and profile significantly.

It is the policy of this etcher that the users can only change the  
etch time of recipes #1, 3, and 4. If you want to make any other  
changes, you can copy the recipe into #5 and then do whatever you want  
to #5.

Thanks,
Jia