From edmyers at stanford.edu Tue Dec 4 10:04:20 2012 From: edmyers at stanford.edu (Ed Myers) Date: Tue, 04 Dec 2012 10:04:20 -0800 Subject: Metal and Dielectric Etch Discussion In-Reply-To: <50B3AB79.1080203@stanford.edu> References: <50B3AB79.1080203@stanford.edu> Message-ID: <50BE3B24.1030900@stanford.edu> All, Thank you for those who attended. For those who did not, please review the attached meeting minutes. Regards, Ed On 11/26/2012 9:48 AM, Ed Myers wrote: > All, > > I would like to meet at 10am on Monday, Dec. 3rd in 101 Allen to > discuss the PlasmaTherm metal and dielectric etch systems. As many of > you know the PlasmaTherm DRIE system has completed it's acceptance. > This means, it is now available for process characterization. I would > like to meet with the etch community to discuss the process needs for > the PlasmaTherm systems. > > Please come to discuss your process needs and what needs to happen on > the PlasmaTherm systems. If you know anyone who needs etches that > have not been supported in the past, please make sure they are invited. > > Regards, > Ed > -------------- next part -------------- A non-text attachment was scrubbed... Name: Metal and Dielectric Meeting 12-3-12.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 29573 bytes Desc: not available URL: