From gsosa at snf.stanford.edu Tue Sep 2 09:20:03 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 2 Sep 2008 09:20:03 -0700 Subject: Problem asml SNF 2008-09-02 09:20:03: Uniformity Problem Message-ID: Lamp uniformity is at 2.73%. ASML FSE notified and will be in at 10:00 AM t work in system. From gsosa at snf.stanford.edu Tue Sep 2 15:35:40 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 2 Sep 2008 15:35:40 -0700 Subject: Comment asml SNF 2008-09-02 15:35:40: Uniformity Issue Update Message-ID: The ASML FSE improved the uniformity from 2.7 to 2.4%. HE collected some data from the tool and will investigate problem further with his tech support group. The shutter is still operating correctly and dose repeatability is good. Please shoot a test wafer if you have any concerns. From mahnaz at snf.stanford.edu Thu Sep 4 16:04:39 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 4 Sep 2008 16:04:39 -0700 Subject: Problem asml SNF 2008-09-04 16:04:39: NEED to do a test wafer Message-ID: I like to suggest that every one start exposing a test wafer before committing your wafer lot. The E0 shows 10mj drift but we have observed greater change. for non critical layers increase 10 to 20 mj but for critical layers you must do a Test wafer. Fse will be in tomorrow around 11 am to work on the system, I have been told. From gsosa at snf.stanford.edu Fri Sep 5 16:19:12 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 5 Sep 2008 16:19:12 -0700 Subject: Shutdown asml SNF 2008-09-05 16:19:11: The Stepper is Down Message-ID: The stepper is down for multiple issues. There is a uniformity and intensity problem that the vendor is working on. There is also a lab chilled water problem and the stepper requires chilled water for the C&T unit to control temperature correctly. The stepper is in an unreliable state and will be kept down until repairs are made. Sorry for the inconveinience. Please check back in CORAL for tool updates. From mahnaz at snf.stanford.edu Mon Sep 8 16:50:32 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Mon, 8 Sep 2008 16:50:32 -0700 Subject: Shutdown asml SNF 2008-09-05 16:19:11: The Stepper is Down Message-ID: Fse has changed the XYZ manipulator and the uniformity is within 2.4%. They do see some issues with the tilt so please run a test wafer and confirm that everything is good before committing your lot. Fse will b back tomorrow to continue their work. From gsosa at snf.stanford.edu Tue Sep 9 16:15:39 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 9 Sep 2008 16:15:39 -0700 Subject: Comment asml SNF 2008-09-09 16:15:38: Uniformity Update 9/9 Message-ID: The ASML FSE's did quite a bit of diagnostic testing and troubleshooting of the illumination system. The X/Y/Z unit for lamp positioning was replaced to fix the lamp drift problem. The FSE's found contamination on the bottom lens due to resist outgassing. After cleaning, the uniformity is now 1.58% and intensity is 700+ mw/cm2. We do still see an energy shift in the tool. The E/0 is 68-70 mj as developed on SVG developers. We still need to do more work in this area to understand and correct the problem. The tool will be up with cauton. IT IS STRONGLY ADVISED THAT YOU DO A FOCUS EXPOSURE MATRIX TO DETERMINE BEST ENERGY FOR YOUR LAYER, AND UPDATE THE EXPOSURE IN YOUR JOBS AS NEEDED. From kevhuang at snf.stanford.edu Tue Sep 9 18:40:13 2008 From: kevhuang at snf.stanford.edu (kevhuang at snf.stanford.edu) Date: Tue, 9 Sep 2008 18:40:13 -0700 Subject: Problem asml SNF 2008-09-09 18:40:12: switching lightsource on failed and... Message-ID: tried shutting down the system and start up again, two errors showed up: 1) exhaust pressure out of range 2) lamp control unit error From ykuo at snf.stanford.edu Tue Sep 9 19:25:09 2008 From: ykuo at snf.stanford.edu (ykuo at snf.stanford.edu) Date: Tue, 9 Sep 2008 19:25:09 -0700 Subject: Problem asml SNF 2008-09-09 19:25:09: switching lightsource on failed Message-ID: Besides the warning mentioned by kevhuang, once you try to do an exposure job, following errors showed up: BL-0103 there's system error BL-2a40 ... .. .. IL-0e12 ... IL-0001 switching lightsource on error From gsosa at snf.stanford.edu Wed Sep 10 09:04:59 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Wed, 10 Sep 2008 09:04:59 -0700 Subject: Shutdown asml SNF 2008-09-10 09:04:58: Focus problem Message-ID: Focus and tilt are out of spec as per IQC test. Vendor will be in to PM the system and address the focus problem. From gsosa at snf.stanford.edu Wed Sep 10 09:08:50 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Wed, 10 Sep 2008 09:08:50 -0700 Subject: Problem asml SNF 2008-09-09 18:40:12: switching lightsource on failed and... Message-ID: Exhaust duct for the lamp house came off and the lamp shut off due to no exhaust to lamp house. Re-connetcted the exhause duct to the stepper. Rebooted the PAS software. Did complete hardware initialization. Restarted and warmed up lamp. All OK - Uniformity= 1.58% and intensisty= 770mw/cm2 From gsosa at snf.stanford.edu Wed Sep 10 09:09:00 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Wed, 10 Sep 2008 09:09:00 -0700 Subject: Problem asml SNF 2008-09-09 19:25:09: switching lightsource on failed Message-ID: Exhaust duct for the lamp house came off and the lamp shut off due to no exhaust to lamp house. Re-connetcted the exhause duct to the stepper. Rebooted the PAS software. Did complete hardware initialization. Restarted and warmed up lamp. All OK - Uniformity= 1.58% and intensisty= 770mw/cm2 From gsosa at snf.stanford.edu Wed Sep 10 16:38:59 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Wed, 10 Sep 2008 16:38:59 -0700 Subject: Shutdown asml SNF 2008-09-10 09:04:58: Focus problem Message-ID: Vendor completed 1st part of quarterly PM. HE cleaned all critical surfaces. He also did red and white light focus , and zeroed out the reference state. Focus and image tilts are now good in IQC test. System is OK to use with the same cautions in place. Please see comments 9/9/2008 for details From shott at stanford.edu Thu Sep 11 07:31:22 2008 From: shott at stanford.edu (John Shott) Date: Thu, 11 Sep 2008 07:31:22 -0700 Subject: Root password for ASML computer in CIS 151? Message-ID: <48C92BBA.70006@stanford.edu> Folks: Does anyone know the root password for the ASML computer in CIS 151? It's probably safer to shut it down properly using the shutdown command .... but if we can't find it by then, I'll have to simply turn the power off before 8 for the DB2 breaker replacement. Thanks, John From gsosa at snf.stanford.edu Thu Sep 11 15:42:26 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 11 Sep 2008 15:42:26 -0700 Subject: Comment asml SNF 2008-09-11 15:42:25: PM completed Message-ID: The vendor completed the quarterly PM. We still have not resolved the energy shift issues. The lamp uniformity and intensity are good. Please use with the same cautions. From johana at snf.stanford.edu Fri Sep 12 00:18:21 2008 From: johana at snf.stanford.edu (johana at snf.stanford.edu) Date: Fri, 12 Sep 2008 00:18:21 -0700 Subject: Problem asml SNF 2008-09-12 00:18:19: Wafer stuck on D-chuck Message-ID: A bonded wafer got stuck on the D-chuck. The exposure ended prematurely and after aborting the batch, a second error message occured and the wafer would not come out. I removed the masks but left the rest as it was. From gsosa at snf.stanford.edu Fri Sep 12 07:05:57 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 12 Sep 2008 07:05:57 -0700 Subject: Shutdown asml SNF 2008-09-12 07:05:56: Wafer stuck Message-ID: Wafer stuck on Discharge Chuck From gsosa at snf.stanford.edu Fri Sep 12 10:38:04 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 12 Sep 2008 10:38:04 -0700 Subject: Problem asml SNF 2008-09-12 00:18:19: Wafer stuck on D-chuck Message-ID: Removed the stranded wafer on the Discharge unit through software. Did not see anything unusual on the back of the wafer and it also passed the UTS granite test. Re-initialized the system and did daily checks. All OK./ From gsosa at snf.stanford.edu Fri Sep 12 10:38:14 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 12 Sep 2008 10:38:14 -0700 Subject: Shutdown asml SNF 2008-09-12 07:05:56: Wafer stuck Message-ID: Removed the stranded wafer on the Discharge unit through software. Did not see anything unusual on the back of the wafer and it also passed the UTS granite test. Re-initialized the system and did daily checks. All OK./ From mahnaz at snf.stanford.edu Mon Sep 15 12:57:28 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Mon, 15 Sep 2008 12:57:28 -0700 Subject: Comment asml SNF 2008-09-15 12:57:28: ust do Exposure matrix Message-ID: Please do a focus /exposer matrix or at least do a exposer matrix till we resolve the exposer issue. From mahnaz at snf.stanford.edu Wed Sep 17 19:07:13 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Wed, 17 Sep 2008 19:07:13 -0700 Subject: Problem asml SNF 2008-09-17 19:07:12: acting strange Message-ID: most likely needs to be reset but I managed to strat the labmember wafers. From ericp at snf.stanford.edu Wed Sep 17 23:45:15 2008 From: ericp at snf.stanford.edu (ericp at snf.stanford.edu) Date: Wed, 17 Sep 2008 23:45:15 -0700 Subject: Shutdown asml SNF 2008-09-17 23:45:15: wafers stuck Message-ID: Two wafers in machine. I wiped the backside of each wafer, AND tested EACH wafer on the ultratech granite flat, and they're stuck. Wafers are only 3000A poly on oxide, nothing weird. No scribes on backside. From gsosa at snf.stanford.edu Thu Sep 18 08:49:58 2008 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 18 Sep 2008 08:49:58 -0700 Subject: Shutdown asml SNF 2008-09-17 23:45:15: wafers stuck Message-ID: Batch would not abort and Wafer handling issues(communicatio) reported in logging file. Will have ASM-L review the logging file. Rebooted the system software and did full startup to initialize all hardware . Removed the stranded wafers(was not a wafer issue). Did daily checks- All OK. Cycled 5 wafers throught he tool with dummy job. All tested OK. From yeh at snf.stanford.edu Thu Sep 18 11:04:40 2008 From: yeh at snf.stanford.edu (yeh at snf.stanford.edu) Date: Thu, 18 Sep 2008 11:04:40 -0700 Subject: Problem asml SNF 2008-09-18 11:04:39: exposure matrix Message-ID: shotmap is not aligned to the flat. rotated shotmap at some arbitrary angle wrt wafer flat. From mahnaz at snf.stanford.edu Tue Sep 23 15:43:39 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 23 Sep 2008 15:43:39 -0700 Subject: Shutdown asml SNF 2008-09-23 15:43:38: lost a wafer on the E chuck Message-ID: From vilanova at snf.stanford.edu Wed Sep 24 11:46:20 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 24 Sep 2008 11:46:20 -0700 Subject: Shutdown asml SNF 2008-09-23 15:43:38: lost a wafer on the E chuck Message-ID: removed wafer from chamber, cleaned chuck , install and calibrated new lamp , Intensity and uniformity within spec. From vilanova at snf.stanford.edu Wed Sep 24 11:46:35 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 24 Sep 2008 11:46:35 -0700 Subject: Problem asml SNF 2008-09-02 09:20:03: Uniformity Problem Message-ID: removed wafer from chamber, cleaned chuck , install and calibrated new lamp , Intensity and uniformity within spec. From vilanova at snf.stanford.edu Wed Sep 24 11:46:53 2008 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 24 Sep 2008 11:46:53 -0700 Subject: Problem asml SNF 2008-09-17 19:07:12: acting strange Message-ID: removed wafer from chamber, cleaned chuck , install and calibrated new lamp , Intensity and uniformity within spec. From mahnaz at snf.stanford.edu Thu Sep 25 12:57:17 2008 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Thu, 25 Sep 2008 12:57:17 -0700 Subject: Comment asml SNF 2008-09-25 12:57:17: Uniformity Message-ID: Fse ran and adjusted the uniformity Last time was 1.9 % and has been adjusted to 1.5%. Please run a test wafer before committing your lot.