Problem asml SNF 2009-09-15 21:07:08: partial exposure

rostam at rostam at
Tue Sep 15 21:07:08 PDT 2009

after exposing some of the cells/dies, there appears a fatal error and the machine can't expose the rest of the cells.
complete_set_next_position: fatal error
error occured during executing iib command (triggered expose): expose wafer stage trigger timeout
tried the wafer twice and it did exactly the same thing; partial exposure.

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