Problem asml SNF 2012-04-20 21:25:21: batch did not finish due to system error

eperalta at snf.stanford.edu eperalta at snf.stanford.edu
Fri Apr 20 21:25:21 PDT 2012


SRD'd all 6 wafers before processing
Last wafer did not expose. The wafer was not rejected, the system simply refused to expose after the first 9 images were exposed. I removed those 9 images from the job definition to force the tool to start exposing at the 10th image but it simply wouldnt.
These are the errors (in chronological order) that i saw on the command line:
WS-6000
WS-1000
LC-0001
EC-0001
IL-0601
IL-470a
IL-0e0a
IL-001
EC-0001
BC-0000
BC-00103
Tested the wafer flatness after removing them and the 6th one performed very poorly. However, a few other's didn't do too well and the system still exposed them with no problem. 




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