From binder.mann at asml.com Mon Jun 2 07:30:33 2008 From: binder.mann at asml.com (Binder Mann) Date: Mon, 2 Jun 2008 10:30:33 -0400 Subject: exposure time for 955 resist on Al In-Reply-To: <93586f8c0805310938q640fd495uaa4a2863a7eea484@mail.gmail.com> Message-ID: <0788D5A046D0134DB5F0CEF36E4EBF61EEC0BC@USWILX84.sn-us.asml.com> Hi Kevin, Try 110mJ in the center (nominal) with a step of 10mJ. If you have any more questions please feel free to contact us. Regards, Binder ________________________________ From: kev.stanford at gmail.com [mailto:kev.stanford at gmail.com] On Behalf Of Kevin Huang Sent: Saturday, May 31, 2008 09:39 To: asml at snf.stanford.edu Subject: exposure time for 955 resist on Al Hi, Could anyone tell me what a good starting exposure time is to try on matrix exposure for 955 resist on Al? Thanks. Kevin -- ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -- The information contained in this communication and any attachments is confidential and may be privileged, and is for the sole use of the intended recipient(s). Any unauthorized review, use, disclosure or distribution is prohibited. Unless explicitly stated otherwise in the body of this communication or the attachment thereto (if any), the information is provided on an AS-IS basis without any express or implied warranties or liabilities. To the extent you are relying on this information, you are doing so at your own risk. If you are not the intended recipient, please notify the sender immediately by replying to this message and destroy all copies of this message and any attachments. ASML is neither liable for the proper and complete transmission of the information contained in this communication, nor for any delay in its receipt. -------------- next part -------------- An HTML attachment was scrubbed... URL: From rostaamm at gmail.com Fri Jun 6 13:14:57 2008 From: rostaamm at gmail.com (Rostam Dinyari) Date: Fri, 6 Jun 2008 13:14:57 -0700 Subject: exposure energy for spr220-7 Message-ID: Hi, I was wondering what the exposure energy is to try on matrix exposure for spr220-7 for 7um thick resist. Thanks, Rostam -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at stanford.edu Fri Jun 6 14:38:04 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 06 Jun 2008 14:38:04 -0700 Subject: Exposure sheet Message-ID: <4849AE3C.7040702@stanford.edu> Hello all, I had few requests from members that they like to see an exposure sheet for ASMl like the one we have for Nikon and other exposure tools. I have made that and is in the Pink/lavender log sheet which has my name on it and is on the table next to the tool. Please fill up the information when you do substrate with different film or you use 220-7, 220-3 or 3617m, your peers will appreciate that. mahnaz From lwchang at stanford.edu Sun Jun 8 23:11:49 2008 From: lwchang at stanford.edu (Li-Wen Chang) Date: Sun, 8 Jun 2008 23:11:49 -0700 Subject: asml resolution Message-ID: <8ab79e460806082311y158b8ab2j3662c309b51aed91@mail.gmail.com> Hi asml users, Does anyone know if I want to push the asml resolution (on snf website it says 0.3um) what kind in-house resist and dose I should use? Any input is greatly appreciated. Thank you, Li-Wen -------------- next part -------------- An HTML attachment was scrubbed... URL: From binder.mann at asml.com Mon Jun 9 11:02:36 2008 From: binder.mann at asml.com (Binder Mann) Date: Mon, 9 Jun 2008 14:02:36 -0400 Subject: Exposure sheet In-Reply-To: <4849AE3C.7040702@stanford.edu> Message-ID: <0788D5A046D0134DB5F0CEF36E4EBF61EEC0E5@USWILX84.sn-us.asml.com> Mahnaz, Good idea, we will update it what info we have so far. Regards, Binder -----Original Message----- From: Mahnaz Mansourpour [mailto:mahnaz at stanford.edu] Sent: Friday, June 06, 2008 14:38 To: asml at snf.stanford.edu Subject: Exposure sheet Hello all, I had few requests from members that they like to see an exposure sheet for ASMl like the one we have for Nikon and other exposure tools. I have made that and is in the Pink/lavender log sheet which has my name on it and is on the table next to the tool. Please fill up the information when you do substrate with different film or you use 220-7, 220-3 or 3617m, your peers will appreciate that. mahnaz -- The information contained in this communication and any attachments is confidential and may be privileged, and is for the sole use of the intended recipient(s). Any unauthorized review, use, disclosure or distribution is prohibited. Unless explicitly stated otherwise in the body of this communication or the attachment thereto (if any), the information is provided on an AS-IS basis without any express or implied warranties or liabilities. To the extent you are relying on this information, you are doing so at your own risk. If you are not the intended recipient, please notify the sender immediately by replying to this message and destroy all copies of this message and any attachments. ASML is neither liable for the proper and complete transmission of the information contained in this communication, nor for any delay in its receipt. From mahnaz at stanford.edu Thu Jun 12 16:49:22 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Thu, 12 Jun 2008 16:49:22 -0700 Subject: Software switch Message-ID: <4851B602.5000306@stanford.edu> Hello all, Today one last time we verified that all jobs, machine constant and reticle data are backed up by ASML fse. We have decided to switch from 8.60 software to 8.90 on Wednesday 18th, this is the version we will run from then on . Asml will do a pm on the system that morning. If you change your job file or create a new job from 3 pm to day till Wednesday morning when we switch the software these new files and new changes will not be there. So please send me an info with your file and we will transfer them for you or simply have the changes saved on the floppy diskette and add it on after the switch. Let Ed or I know if you need help. mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From jsuarez at nanosysinc.com Mon Jun 16 15:56:05 2008 From: jsuarez at nanosysinc.com (Josephine Suarez) Date: Mon, 16 Jun 2008 15:56:05 -0700 Subject: Resevations cancelled 6/17/08 from 1 to 2:30 pm Message-ID: <98A950CEC6D73D4BB644B880D0254D2F01BCABF7@mail1.at.nanosysinc.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at stanford.edu Thu Jun 19 09:21:09 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Thu, 19 Jun 2008 09:21:09 -0700 Subject: ASML down time Message-ID: <485A8775.4040609@stanford.edu> Hello all, This is a reminder that ASML will be down Starting *Monday 23rd at 9am till Friday 27th at 5 pm for 3D calibration and qualification; this has been previously announced. *Yesterday during the pm the stage gave an error which we have been kind of aware of it. The tool needs to go down before Monday as well to get the stage ( stone) fixed.; this is critical to 3D calibration. we all trying to get things scheduled and I will let you know as soon as I Have the information. Please do not panic things might get switched around any way. *Also I like to take this opportunity and let you all know that Binder has decided to pursue happiness out side of ASML. Thursday 26th will be her last day if you like to come by and thank her for all she has done for us next week will be a good time. * mahnaz From mahnaz at stanford.edu Fri Jun 20 18:48:19 2008 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 20 Jun 2008 18:48:19 -0700 Subject: Reservation Message-ID: <485C5DE3.2050907@stanford.edu> Hello all, I just thought to send this email out and let every one know that I need my reservation tomorrow at 5:30 pm on the tool. We are planing to change the rotator on the tool that helps the stone to go in and out i f the part gets here tomorrow. we will need few hours and the tool will up for the rest of the evening till Monday morning as planned. mahnaz From envy at ee.ucla.edu Sat Jun 21 17:48:50 2008 From: envy at ee.ucla.edu (Girish) Date: Sat, 21 Jun 2008 17:48:50 -0700 (PDT) Subject: Metal (Al) layer alignment issue In-Reply-To: <485C5DE3.2050907@stanford.edu> References: <485C5DE3.2050907@stanford.edu> Message-ID: Hi Mahnaz I am doing a backend process and am trying to align an aluminum layer to holes in oxide beneath the aluminum layer (standard contact hole and metallization process) with the ASML. Resist is 1um Shipley positive and I use 60mJ/cm^2 energy, which defines the metal patterns well. - Misalignment: Every die is misaligned and by a different amount both in the x-y direction. There are a few devices in the dead centre which seem to be aligned and from the centre the misalignment begins to spiral out. The alignment of the reticle layer has been checked before by aligning to the contact layer beneath, but without metal. So it is not a mask or machine offset problem. _ Rejection of wafers: Sometimes the wafer gets rejected and sometimes it exposes it but always with the same misalignment mentioned before. I am told that the ASML reticles have a layer which just opens up the area around the marks. I could use that to remove the metal and try aligning through the passivation layer beneath it. Can you give any other ideas? Any help/suggestion will be appreciated. Thanks Girish From gsosa at stanford.edu Mon Jun 23 07:48:34 2008 From: gsosa at stanford.edu (Gary J Sosa) Date: Mon, 23 Jun 2008 07:48:34 -0700 Subject: Loading reticles on ASM-L stepper Message-ID: <20080623074834.6wk8r5kajcc088ck@webmail.stanford.edu> Hi Users... There was a problem reported on the stepper that you could not click on the "Accept" button after the barcodes have been read. In the 8.90 software rev., this is normal as confirmed by ASM-L. After the barcodes have been read, the system will wait for the user to click on "Cancel" to exit this step. The mouse cursor will be a "ticking clock with an arrow sticking out if the side", and the "accept" button will not be active. Clicking on "Cancel" will return you to the "material handling" screen. From this point you can exit and go to "batch control" and continue your batch setup. ... Gary From mtang at stanford.edu Tue Jun 24 13:48:18 2008 From: mtang at stanford.edu (Mary Tang) Date: Tue, 24 Jun 2008 13:48:18 -0700 Subject: Farewell, Binder! Message-ID: <48615D92.207@stanford.edu> Greetings ASML users and members of the ASML community -- As you may have heard, Binder Mann will be leaving ASML; her last day here at SNF is Thursday. We will all deeply miss her. She is the heart and soul of the ASML program here at SNF. And we will miss her warmth and friendliness, not to mention her astounding knowledge of all things ASML. Please join us in showing our appreciate for Binder's support for our lab and sharing some cake -- tomorrow, Wednesday, June 25, at 2 pm, in the breakroom. Your SNF Staff -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From kevhuang at stanford.edu Fri Jun 27 15:45:43 2008 From: kevhuang at stanford.edu (Kevin Huang) Date: Fri, 27 Jun 2008 15:45:43 -0700 Subject: etching ASML alignment marks using P5000 Message-ID: <93586f8c0806271545v4ab7dc97i6b9bac5409273b1d@mail.gmail.com> Hi, Could anyone please tell me if there is a recipe for etching the alignment marks for ASML on P5000? Thanks. Kevin ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ================================== -------------- next part -------------- An HTML attachment was scrubbed... URL: From jameson at stanford.edu Fri Jun 27 16:25:22 2008 From: jameson at stanford.edu (John Ross Jameson) Date: Fri, 27 Jun 2008 16:25:22 -0700 (PDT) Subject: etching ASML alignment marks using P5000, AMT, & MRC Message-ID: Hi, I'd also like to know if there's now a recipe for the AMT and/or MRC etchers. Thanks, John ---------- Forwarded message ---------- Date: Fri, 27 Jun 2008 15:45:43 -0700 From: Kevin Huang To: asml at snf.stanford.edu Subject: etching ASML alignment marks using P5000 Hi, Could anyone please tell me if there is a recipe for etching the alignment marks for ASML on P5000? Thanks. Kevin ================================== Kevin Huang Ph.D. Candidate Stanford Organic Electronics Lab Dept. of Electrical Engineering Email: kevhuang at stanford.edu Phone: (650) 725-6924 ==================================