exposure time for 955 resist on Al
binder.mann at asml.com
Mon Jun 2 07:30:33 PDT 2008
Try 110mJ in the center (nominal) with a step of 10mJ.
If you have any more questions please feel free to contact us.
From: kev.stanford at gmail.com [mailto:kev.stanford at gmail.com] On Behalf
Of Kevin Huang
Sent: Saturday, May 31, 2008 09:39
To: asml at snf.stanford.edu
Subject: exposure time for 955 resist on Al
Could anyone tell me what a good starting exposure time is to try
on matrix exposure for 955 resist on Al?
Stanford Organic Electronics Lab
Dept. of Electrical Engineering
Email: kevhuang at stanford.edu
Phone: (650) 725-6924
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