exposure time for 955 resist on Al

Kevin Huang kevhuang at stanford.edu
Sat May 31 09:38:58 PDT 2008

       Could anyone tell me what a good starting exposure time is to try on
matrix exposure for 955 resist on Al?



Kevin Huang
Ph.D. Candidate
Stanford Organic Electronics Lab
Dept. of Electrical Engineering
Email: kevhuang at stanford.edu
Phone: (650) 725-6924
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/asml/attachments/20080531/1a27c1f4/attachment.html>

More information about the asml mailing list