From mahnaz at stanford.edu Mon Jun 6 15:43:10 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Mon, 06 Jun 2011 15:43:10 -0700 Subject: New Box and cassette Message-ID: <4DED57FE.8060309@stanford.edu> Hello all, We have designated a new Black box with a Teflon cassette that has 3 black pin on it for the SRD use. This cassette should be used after you are done with spin and have cleaned any wafers with backside residue. The box is sitting on top of the SRD and labeled " ASML SRD only". Please let us know if you find it dirty and we will clean it. Please note that since we are rinsing all the wafers after spin we have not had that many issues with particles. mahnaz From mahnaz at stanford.edu Fri Jun 10 14:24:44 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 10 Jun 2011 14:24:44 -0700 Subject: asml particle on chuck Message-ID: <4DF28B9C.5090108@stanford.edu> Hello all, I just want to remind every one of the followings.... We had a meeting on May 11th that Jason Parker helped to put it together in order to discuss the issues of particle on the chuck for ASML tool. The attendance was low but had been communicated to you all that if you do not voice your concern you will strictly follow the outcome of the meeting. Here one more time. You are responsible to inspect 100% back of all the wafers after taking them off the SVGcoaters. Clean back of any wafers with EBR or resist residue with q tips and acetone. Run ALL wafers through SRD (SPIN RINSE DRYER) in Teflon cassette with 3 black pins which is in black box on top of the SRD( labeled ASML only). This is another reminder that " the particle on chuck " gets check every day so we will take a group's privilege off if we see gross negligence. so you are responsible to correct and guide the one that are not following the procedure. On a positive note, since every one is been more carful and following the procedure we have not had particle on chuck sine May 13th. So cleaning the back of wafers and the SRD rinse, it is seems to be working. All these info are in the binder next to the tool and on the Wiki. * I like to take the opportunity and thank Uli and Lili for all the help with measuring particles for different tool sets. * Let us know of any issues and concern litho team -------------- next part -------------- An HTML attachment was scrubbed... URL: From sclaussen at stanford.edu Wed Jun 15 14:07:18 2011 From: sclaussen at stanford.edu (Stephanie Claussen) Date: Wed, 15 Jun 2011 14:07:18 -0700 Subject: 220-3 exposure dose on ASML? Message-ID: Hello, I'm interested in using 220-3 on ASML, and was curious what exposure dose other people typically use for this resist. I know Mahnaz has a suggested dosage listed in the binder next to the tool, but I wanted to check to see what other uses have been doing recently as well. Thanks, Stephanie -------------- next part -------------- An HTML attachment was scrubbed... URL: