From gsosa at stanford.edu Wed Nov 2 15:38:36 2011 From: gsosa at stanford.edu (Gary J Sosa) Date: Wed, 2 Nov 2011 15:38:36 -0700 (PDT) Subject: ASML Stepper scheduled shutdown on 11/3/2011 Message-ID: Hello ASML Stepper Users- This is just a gentle reminder of the planned and scheduled shutdown of the ASML Stepper on Thursday, November 3rd 2011. Please read below for details Important Notice- Please read : The ASML Stepper will be shut down this Thursday(11/3) , beginning at 7:00 am to complete an upgrade to the process cooling water system as part of the overall lab renovation. The work is estimated to take 8 hours to complete with at least an equal amount of time to re-stabilize the stepper. This time however could be considerably shorted depending on how quickly the contractors complete the necessary work. Please make plans accordingly during this scheduled downtime. Check Coral or ask a Litho staff member for the latest tool update. Thank you for your patience and understanding. The Litho Team -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Thu Nov 3 15:53:56 2011 From: gsosa at stanford.edu (Gary J Sosa) Date: Thu, 3 Nov 2011 15:53:56 -0700 (PDT) Subject: ASML Stepper released for non-criticals only In-Reply-To: Message-ID: <1a17fe5e-bd66-4b84-b597-76849b7da450@Gary-PC> Hello Stepper Users... We are releasing the stepper for non-critical work only. The stepper lens temperature is still stabilizing. The focus is currently at +0.15 microns of nominal. We advise to use the stepper for non-critical work only or to shoot and disposition a test wafer before committing all of your wafers. We will leave it up to your discretion. Thanks... The Litho Team -------------- next part -------------- An HTML attachment was scrubbed... URL: From haemmerl at stanford.edu Fri Nov 4 13:11:13 2011 From: haemmerl at stanford.edu (Alexandre Hammerli) Date: Fri, 4 Nov 2011 13:11:13 -0700 (PDT) Subject: Reservation released 5:30pm to 7pm Message-ID: <410832229.275643.1320437473064.JavaMail.root@zm06.stanford.edu> Picked earlier slot. From gyama.snf at gmail.com Mon Nov 7 11:07:21 2011 From: gyama.snf at gmail.com (Gary Yama - SNF) Date: Mon, 7 Nov 2011 11:07:21 -0800 Subject: fpurkl will not use his noon time, but Mahnaz will start at 1:30pm today Message-ID: -------------- next part -------------- An HTML attachment was scrubbed... URL: From qran at stanford.edu Mon Nov 7 20:55:51 2011 From: qran at stanford.edu (Qiushi (Helen) Ran) Date: Mon, 7 Nov 2011 20:55:51 -0800 (PST) Subject: asml time release from 4pm to 5:30pm 11/08/11 Message-ID: <1937283976.142569.1320728151077.JavaMail.root@zm04.stanford.edu> take an earlier session. Qiushi(Helen) Ran ========================================= Department of Electrical Engineering Stanford University, Stanford, CA 94305. Mobile: +1-650-796-1439 Email: qran at stanford.edu From qran at stanford.edu Thu Nov 10 12:01:38 2011 From: qran at stanford.edu (Qiushi (Helen) Ran) Date: Thu, 10 Nov 2011 12:01:38 -0800 (PST) Subject: asml time release from 2pm to 3:30pm Today Message-ID: <1286990596.359139.1320955298002.JavaMail.root@zm04.stanford.edu> Qiushi(Helen) Ran ========================================= Department of Electrical Engineering Stanford University, Stanford, CA 94305. Mobile: +1-650-796-1439 Email: qran at stanford.edu From mahnaz at stanford.edu Thu Nov 10 15:25:05 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Thu, 10 Nov 2011 15:25:05 -0800 Subject: ASML down Message-ID: <4EBC5D51.80706@stanford.edu> Hello all, An asml fse will be here to assess the burning smell of the electrical rack some times this evening. We will know by tomorrow what is needed and the extend of the down time. At the moment, i do not have any idea or estimate but will update you AS soon as i have the information. Litho team From mahnaz at stanford.edu Fri Nov 11 13:10:25 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Fri, 11 Nov 2011 13:10:25 -0800 Subject: Update Message-ID: <4EBD8F41.3020505@stanford.edu> Hello all, It looks like the UV lamp power supply is bad. ASML will have a power supply here on Monday( shipping from Taiwan). Tool stabilization typically takes 12 to 24 hours. Were looking at possibly Tuesday for full recovery. This is if we get the part on time and everything else behaves as normal. Litho team From gsosa at stanford.edu Fri Nov 11 15:53:15 2011 From: gsosa at stanford.edu (Gary J Sosa) Date: Fri, 11 Nov 2011 15:53:15 -0800 (PST) Subject: ASML Stepper Shutdown Update 11/11/11 In-Reply-To: <37728eab-40cc-4290-8366-b4a946b0154b@Gary-PC> Message-ID: <8b4e1d4b-8dec-4720-b2da-a6c6f4755217@Gary-PC> Hello ASML Stepper Users.... The Stepper will be down and unavailable this weekend due to the unexpected failure of the UV lamp power supply. ASML has rush ordered a replacement power supply. The Power supply is being shipped from Taiwan and is expected to arrive Monday morning. The stepper will need to stabilize after the repairs are made and this typically takes 12 to 24 hours. Best case, the tool will be ready to expose wafers sometime on Tuesday. Please check back in Coral for further tool updates and status. Sorry for the inconvenience. thanks... The Litho Team -------------- next part -------------- An HTML attachment was scrubbed... URL: From gsosa at stanford.edu Mon Nov 14 15:58:02 2011 From: gsosa at stanford.edu (Gary J Sosa) Date: Mon, 14 Nov 2011 15:58:02 -0800 (PST) Subject: ASML STEPPER RELEASED FOR NON-CRITICLAS ONLY!!!! Message-ID: HELLO ALL.. WE ARE CONDITIONALLY RELEASING THE STEPPER FOR NON-CRITICAL PROCESSING ONLY. ONCE THE WARNING MESSAGE AT THE BOTTOM OF THE SCREEN HAS CLEARED, THE TOOL CAN BE USED FOR NON-CRITICAL WORK. TOMORROW WE WILL VERIFY THE STABILITY OF THE TOOL AND CHECK CRITICAL PARAMETERS. THE WARNING SHOULD CLEAR AROUND 18:00 TO 19:00 HOURS. Thanks... The Litho Team -------------- next part -------------- An HTML attachment was scrubbed... URL: From Toru.Ito at us.tel.com Thu Nov 17 06:28:24 2011 From: Toru.Ito at us.tel.com (Toru.Ito at us.tel.com) Date: Thu, 17 Nov 2011 07:28:24 -0700 Subject: ASML free 6:30 - 7:30 Message-ID: -------------- next part -------------- An HTML attachment was scrubbed... URL: From mahnaz at stanford.edu Sun Nov 20 09:18:59 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Sun, 20 Nov 2011 09:18:59 -0800 Subject: Problem asml SNF 2011-11-19 16:39:47: energy sensor out of range error In-Reply-To: <20111120003948.751CF5D45@smtp-unencrypted.stanford.edu> References: <20111120003948.751CF5D45@smtp-unencrypted.stanford.edu> Message-ID: <4EC93683.7060608@stanford.edu> The error some times shows up, we are aware of it and causes no issue. mahnaz On 11/19/2011 4:39 PM, ehe at snf.stanford.edu wrote: > seems to work anyway. > From clchang6 at stanford.edu Mon Nov 21 18:03:35 2011 From: clchang6 at stanford.edu (Chienliu Chang) Date: Mon, 21 Nov 2011 18:03:35 -0800 Subject: ASML problem Message-ID: <1D5B57A1161F428384F8B89DC016ACB6@corp.cusa.canon.com> Dear Mahnaz, I am sorry to bother you about ASML. My input cassette was down but the monitor showed one of my wafers was stuck inside ASML. In fact, no wafer was transferred inside. I took my wafers out but it still stopped. Could you restart ASML? Thanks a lot. Chienliu ------------------------------------------------- Chienliu Chang, Ph.D. Khuri-Yakub Laboratory Edward L. Ginzton Laboratory, Box 125 Center for Nanoscale Science & Engineering, room 101 Stanford University 348 Via Pueblo, Stanford, CA 94305-4088 Phone: 650-725-2265 Email: clchang6 at stanford.edu clchang6 at ntu.edu.tw ------------------------------------------------- From lupin000 at stanford.edu Tue Nov 29 16:20:44 2011 From: lupin000 at stanford.edu (Ki Wook Jung) Date: Tue, 29 Nov 2011 16:20:44 -0800 (PST) Subject: Appropriate exposure power for 10um SPR220-7 In-Reply-To: <1336629123.712083.1322612417520.JavaMail.root@zm05.stanford.edu> Message-ID: <128303870.712113.1322612444226.JavaMail.root@zm05.stanford.edu> Hi all, I want to know how much energy I need to use to expose 10um SPR220-7. If there is someone who uses SPR220-7 resist and coat wafers with 10um of SPR220-7, please let me know the power level you are using. Thank you. Ki Wook From mahnaz at stanford.edu Wed Nov 30 13:21:19 2011 From: mahnaz at stanford.edu (Mahnaz Mansourpour) Date: Wed, 30 Nov 2011 13:21:19 -0800 Subject: Appropriate exposure power for 10um SPR220-7 In-Reply-To: <128303870.712113.1322612444226.JavaMail.root@zm05.stanford.edu> References: <128303870.712113.1322612444226.JavaMail.root@zm05.stanford.edu> Message-ID: <4ED69E4F.40700@stanford.edu> Hi Ki Wook, If you look in to exposure chart in the binder next to the tool for 7 um the E0 is 300 mj. For 10 um is around 400mj. You should still do a test wafer or an Exposure matrix because your reticle and the feature size will influence the exposure. mahnaz On 11/29/2011 4:20 PM, Ki Wook Jung wrote: > Hi all, > > I want to know how much energy I need to use to expose 10um SPR220-7. If there is someone who uses SPR220-7 resist and coat wafers with 10um of SPR220-7, please let me know the power level you are using. Thank you. > > Ki Wook From ysohn at stanford.edu Wed Nov 30 15:59:35 2011 From: ysohn at stanford.edu (Young Ik Sohn) Date: Wed, 30 Nov 2011 15:59:35 -0800 (PST) Subject: ASML released 21:30~22:30 today(eom) Message-ID: <1895828376.661843.1322697575542.JavaMail.root@zm08.stanford.edu>