From nxs4059 at snf.stanford.edu Wed Jun 1 15:39:52 2011 From: nxs4059 at snf.stanford.edu (nxs4059 at snf.stanford.edu) Date: Wed, 1 Jun 2011 15:39:52 -0700 Subject: Shutdown aw610_r SNF 2011-06-01 15:39:52: Brown residue all over Message-ID: There is a brown residue all over the interior of the chamber and on the wafer holder. Looks like somebody burned something in it... needs to be cleaned. From emyers at snf.stanford.edu Fri Jun 3 12:27:48 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Fri, 3 Jun 2011 12:27:48 -0700 Subject: Shutdown aw610_r SNF 2011-06-01 15:39:52: Brown residue all over Message-ID: Wet cleaned chamber. Needs calibration and qualification From emyers at snf.stanford.edu Fri Jun 3 12:28:21 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Fri, 3 Jun 2011 12:28:21 -0700 Subject: Problem aw610_r SNF 2011-06-03 12:28:20: Needs qualification Message-ID: System has not been calibrated following chamber wet clean. From emyers at snf.stanford.edu Mon Jun 6 11:14:56 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Mon, 6 Jun 2011 11:14:56 -0700 Subject: Comment aw610_r SNF 2011-06-06 11:14:56: Qual Plan Message-ID: I have arranged for the system to be qualified by lab members while I'm on vacation. The qualification is critical for the pyrometer, but not the TC. We had to do a wet clean on the chamber, which changes the window thickness they pyrometer looks through. This could change the calibration for the pyrometer. If you are using the TC, there should be no shift in the calibration. From jasonlin at snf.stanford.edu Mon Jun 6 18:11:16 2011 From: jasonlin at snf.stanford.edu (jasonlin at snf.stanford.edu) Date: Mon, 6 Jun 2011 18:11:16 -0700 Subject: Comment aw610_r SNF 2011-06-06 18:11:15: QUAL1150 Results Message-ID: 5 diff cleaned wafers, QUAL1150 recipe 9 point measurement on woollam 1: Mean 122.8A, Std Dev 2.2 2: Mean 124.4A, Std Dev 2.8 3: Mean 122.5A, Std Dev 2.5 4: Mean 126.1A, Std Dev 2.8 5: Mean 125.3A, Std Dev 3.9 From altamash at snf.stanford.edu Sun Jun 12 13:00:25 2011 From: altamash at snf.stanford.edu (altamash at snf.stanford.edu) Date: Sun, 12 Jun 2011 13:00:25 -0700 Subject: Comment aw610_r SNF 2011-06-12 13:00:24: Carrier wafers Message-ID: Somebody frogot carrier wafers in and on the machine. Also, there seems to be a few particels on the quartz holder. Maybe can be removed by N2blowdry. Thanks, Altamash From ryhuang at snf.stanford.edu Tue Jun 28 10:37:48 2011 From: ryhuang at snf.stanford.edu (ryhuang at snf.stanford.edu) Date: Tue, 28 Jun 2011 10:37:48 -0700 Subject: Shutdown aw610_r SNF 2011-06-28 10:37:48: wafer flaked inside chamber Message-ID: Quartzware and possibly chamber need cleaning. While running a 675C anneal, surface film (Ti) flaked off from part of the wafer. From emyers at snf.stanford.edu Tue Jun 28 14:15:34 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Tue, 28 Jun 2011 14:15:34 -0700 Subject: Shutdown aw610_r SNF 2011-06-28 10:37:48: wafer flaked inside chamber Message-ID: Removed flakes from the chamber. System is ready for use From emyers at snf.stanford.edu Thu Jun 30 08:32:28 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Thu, 30 Jun 2011 08:32:28 -0700 Subject: Comment aw610_r SNF 2011-06-30 08:32:27: Pyrometer Mode Message-ID: From emyers at snf.stanford.edu Thu Jun 30 16:56:04 2011 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Thu, 30 Jun 2011 16:56:04 -0700 Subject: Comment aw610_r SNF 2011-06-30 08:32:27: Pyrometer Mode Message-ID: back to TC Mode