ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training classes on the Headway for January 2009

James Conway jwc at snf.stanford.edu
Fri Jan 9 08:43:08 PST 2009


*

**ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on 
the Headway Coater.
*
Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training classes 
Tuesday January 13 and 27th, 2009 from 10:15 AM  - 12:30 PM.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these 
applications accurate control of polymer thickness is important in order 
to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana clean and HF etching of the intrinsic native oxide on 
Silicon wafers.  All users must have their substrates cleaned and ready 
to go for spinning by the session time; either coming out of the 150 
degree Singe oven, or if you are working on oxides or nitrides, coming 
out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever resist system you desire for your 
work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

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