ANNOUNCEMENT: Raith Group XXXVII - Four Day Short Course for Basic RAITH 150 Users Tuesday to Friday May 12 to 15th, 2009 10 AM to 6 PM

James Conway jwc at
Mon May 11 12:28:35 PDT 2009

*Greetings RAITH Group XXXVII:
If you are listed in the To: section of this email you are confirmed to 
be in RAITH Group** XXXVII.

If **you are listed as a CC:  I am** still ** in need of further 
information from you! I hope to add you in the next Raith class, if you 
cannot attend these sessions.

**All interested parties are invited to the Tuesday morning lecture 
session from 10:00 AM  - 12:30 PM,  and the following Demo Layer One 
training from 2 PM - 6 PM in the afternoon.
**Any RAITH User wishing to attend are welcome if you desire a review of 
operations on the RAITH 150 system during any part of the class.*

*If you are listed in the To: section of this email:
*This is your reminder and confirmation of your commitment for attending 
the RAITH Group XXXVII Training course to be held this week.
You must have completed the prerequisite ALL LITHO and SEM training in 
order to attend as a participant. Otherwise you may attend as an Observer.
_*You are expected to attend all sessions in order to gain the 
experience and skills you will need to qualify on the RAITH 150 system.*

_Users are also encouraged to attend the *"Take a Spin with Me"* class 
covering Ebeam Resist handling procedures. I am holding this class next 
on Tuesday May 19th, 2009 from 10:15 - 12:30 PM.

Thank you for your interest in Electron Beam Technologies at the 
Stanford Nanofabrication Facility,

James Conway
Ebeam Technology Group

* **RAITH Group** XXXVII **Schedule: **

*Raith 150 Basic Users Training -- Intensive 4 Day Short Course*

*May 12 to 15th, 2009 from 10 - 6 PM Tuesday through Friday.*

*The Plan of Action:
*We will start out with a half day of lecture in the morning Tuesday; 
quickly moving into entirely 'hands on' operations training sessions 
through the remainder of the week.
We will break for lunch at various times, normally while the system is 
writing, so plan to be flexible with your other outside commitments.  
You should start working on your GDS II patterns and preparing PMMA on 
your substrates if you wish to write on your material. Please bring your 
GDS II patterns, or simply your designs to the 'Hands-On' sessions.*

* Schedule:*
Tuesday May 12, 2009:
10:00 - 12:30   Session 1:  Basic Users Course Lecture  -- CIS - 201
14:00 - 18:00  Session 2:  RAITH System Demonstration - Layer One -- 

Wednesday May 13, 2009:
10:00 - 12:30 Session 3:  Hands On training session One -- Layer Two: 
OVERLAY Layer 1 to Layer 2 registration -- EBEAM LAB CIS L104
14:00 - 18:00 Session 4:   Hands On training session Two -- EBEAM LAB 
CIS L104

Thursday May 14, 2009:
10:00 - 12:30 Session 5: Hands On training session Three -- EBEAM LAB 
CIS L104
14:00 - 18:00 Session 6: Hands On training session Four   -- EBEAM LAB 
CIS L104

Friday May 15, 2009
10:00 - 12:30 Session 7: Hands On training session Five -- EBEAM LAB CIS 
14:00 - 16:00 Session 8:  Hands On training session Six  -- EBEAM LAB 
CIS L104

Individual Qualification Sessions will be held after this class where 
you can demonstrate your skill on the system to me and gain your login 
to the system.
Raith User Qualification sessions are now scheduled for the following times:
Tuesday May 19th, 2009 from 2:00 to 6:00 PM
Thursday May 21, 2009 from 1:00 to 6:00 PM.


James W. Conway

Stanford Nanofabrication Facility

Stanford University

650-725-7075 -- 415-412-4825

jwc at <mailto:jwc at>


1. Helen Chen helencxy at 
<mailto:helencxy at> Coral: helencxy
 Phillip Wong Group, Project: Graphene Nanostructures for physical 
Characterization for device parameters.

2. Pengyu Fan fanpy839 at <mailto:fanpy839 at> 
Coral: fanpy
Mark Brongersma Group, Project: Si/Ge Nanowire Devices

3. Timothy Phung timphung at <mailto:timphung at> 
Coral:  tphung
Harris Group Project: Magnetic Coupled Spin Torque Devices

4.  Wanki Kim wanki at <mailto:wanki at> Coral: wanki
Simon Wong Group Project: Resistive RAM in 3D IC.  Features to 20 -- 100 nm

5.   Wenshan Cai caiw at <mailto:caiw at> Coral: caiw
Brongersma Group Project: Nano-scale Plasmonic devices from simulation 
to reality.

6.  Fuming Wang fmwang at <mailto:fmwang at> Coral: 
Dai Group Project: BR in Graphene nanoribbons devices.



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