Ebeam may be coming up for users this week. Seeking patterns to test on the system working with you!
James W. Conway
jwc at snf.stanford.edu
Wed Mar 3 10:41:21 PST 2010
I just received the Hitachi Field service report and their measurements
exhibited stable emission current and beam position stability over time
o the testing.
They SEM'ed and confirmed the CD's for line width patterns in the 50 -
500 nm range using our Line and Space patterns measured using a
calibrated SEM at their facility in Texas. Best line achieved was a 53
nm line written in 300 nm PMMA at 550 µC/CM**2 dosage on a 60 nm pattern
We will be confirming these results in further test of the system in
Thank you for your support!
James W. Conway wrote:
> Greetings Ebeam Users:
> The PM was completed last week on the Hitachi HL-700 F we call EBEAM.
> We are in the middle of the qualification testing and hope to be up to
> all qualified Users later this week.
> Seeking both qualified and new users seeking access to the system to
> test their patterns on this tool.
> Most of the parameters on this tool are fixed and it is a great
> introduction to EBL if you are a new User.
> This is a very fast Ebeam system with 100 MHz pattern generator and
> suitable for wafers up to 100 mm or pieces.
> I hope to resume my bi-weekly 'Open Lab for New Users' starting Monday
> march 22, 2010. Please see me during my office hours if you are
> All the Best,
> James Conway
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