From gyama.snf at gmail.com  Thu Aug 30 16:03:15 2012
From: gyama.snf at gmail.com (Gary Yama - SNF)
Date: Thu, 30 Aug 2012 16:03:15 -0700
Subject: info from 8/24/2012, PECVD oxide
Message-ID: <CACU65xg2=_QZthGTfDu9_PrhdQXzM8aiKA5+Vq9c2=b8bBVSCw@mail.gmail.com>

PECVD oxide recipe, 3.0' @ 350C

2412A	top
2409A	center
2403A	flat
2404A	left
2402A	right

40 second etch in 6:1 BOE, wafer dewetted, ~3600A/min etch rate

Stress:
Before: -107.912  meters radius of curvature
After:  +712.006 meters radius of curvature

-375.74Mpa compressive