Comment cmp SNF 2009-09-23 11:56:43: tested new s-10 slurry

filip at filip at
Wed Sep 23 11:56:44 PDT 2009

yesterday, conditioned the CMP using Kihyun procedure, using Ge as a dummy wafer.
Tested 60sec with Ge - one scratch across the length of wafer
Tested 180sec with Ge - 6-8 scratches across the length of wafer
Scratches were not evident by naked eye. Only apparent by DF microscopy.

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