From gyama at snf.stanford.edu  Wed Apr  2 15:18:06 2008
From: gyama at snf.stanford.edu (Gary Yama (SNF))
Date: Wed, 02 Apr 2008 15:18:06 -0700
Subject: CMP will be switched to metal FRI morning
Message-ID: <47F4061E.20007@snf.stanford.edu>




From cmcg at stanford.edu  Mon Apr 14 15:38:26 2008
From: cmcg at stanford.edu (Christopher McGuinness)
Date: Mon, 14 Apr 2008 15:38:26 -0700
Subject: cmp polish rate and epd update
Message-ID: <393d7fe80804141538j462c7fb5nc482cb5a5316ebf2@mail.gmail.com>

Hi all,
For those that are interested I've included a more detailed polishing rate
analysis for the S10 slurry polishing oxide and poly.  Selectivity is fairly
poor, between 1:2 or 1:3 depending on the polishing time.  Good news is that
the end point detector works, and can detect a difference in friction
between poly and oxide.  Hope this saves time for others doing similar work.
-Chris McGuinness
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/cmp/attachments/20080414/55e57b8e/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: CMP_oxide_polish_rate_analysis.jpg
Type: image/jpeg
Size: 70988 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/cmp/attachments/20080414/55e57b8e/attachment.jpg>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: CMP_poly_polish_rate_analysis.jpg
Type: image/jpeg
Size: 40568 bytes
Desc: not available
URL: <http://snf.stanford.edu/pipermail/cmp/attachments/20080414/55e57b8e/attachment-0001.jpg>

From edmyers at stanford.edu  Fri Apr 18 10:39:45 2008
From: edmyers at stanford.edu (Ed Myers)
Date: Fri, 18 Apr 2008 10:39:45 -0700
Subject: Fwd: Horizontal tube cleaner removal
Message-ID: <6.2.5.6.2.20080418103818.027be048@stanford.edu>

All,

This will probably have an even larger impact on the CMP 
availability.  I have reserved the system for all of Monday to remind everyone.

Also, I updated the specification with the slower table speeds and 
polishing pressures.  I also modified the Auto programs to reflect 
these changes.

Ed


>X-Sieve: CMU Sieve 2.3
>Delivered-To: edmyers at stanford.edu
>Delivered-To: emyers at snf.stanford.edu
>Mailing-List: contact labmembers-help at snf.stanford.edu; run by ezmlm
>X-No-Archive: yes
>List-Post: <mailto:labmembers at snf.stanford.edu>
>List-Help: <mailto:labmembers-help at snf.stanford.edu>
>List-Unsubscribe: <mailto:labmembers-unsubscribe at snf.stanford.edu>
>List-Subscribe: <mailto:labmembers-subscribe at snf.stanford.edu>
>Delivered-To: mailing list labmembers at snf.stanford.edu
>Delivered-To: moderator for labmembers at snf.stanford.edu
>Date: Fri, 18 Apr 2008 06:38:07 -0700
>From: Ted Berg <tberg at stanford.edu>
>User-Agent: Mozilla/5.0 (Windows; U; Windows NT 5.1; en-US; 
>rv:1.7.2) Gecko/20040804 Netscape/7.2 (ax)
>X-Accept-Language: en-us, en
>To: "labmembers at snf.stanford.edu" <labmembers at snf.stanford.edu>
>Subject: Horizontal tube cleaner removal
>
>Hello all,
>    Just a heads up. The horizontal tube cleaner in the 
> wafersaw-bottle clean room will be removed on Monday April 21 so 
> the room will be very noisy and dirty i have reseved the saw for 
> that day so it as well as polisher will not be available. Thanks in 
> advance for your cooperation, ted