cmp polish rate and epd update

Christopher McGuinness cmcg at stanford.edu
Mon Apr 14 15:38:26 PDT 2008


Hi all,
For those that are interested I've included a more detailed polishing rate
analysis for the S10 slurry polishing oxide and poly.  Selectivity is fairly
poor, between 1:2 or 1:3 depending on the polishing time.  Good news is that
the end point detector works, and can detect a difference in friction
between poly and oxide.  Hope this saves time for others doing similar work.
-Chris McGuinness
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