Fwd: Comment cmp SNF 2011-05-06 10:13:32: Clean Non-Metal, New Membrane

[Ed Myers]

All,

I left the membrane on the table for anyone to look at.  To me we 
have a lab member who is not willing to maintain the system and wants 
to have cmp done somewhere other than the SNF.

Even it the lab member could not hear, see or feel the leak while 
inflating the membrane someone should have seen all the slurry on the 
backside of the polishing head when it was removed.  There should not 
be slurry in this area and it was covered.  And they didn't even clean it up.

Remember, if you do not report a problem you have taken ownership of 
that problem.

Ed


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>Subject: Comment cmp SNF 2011-05-06 10:13:32: Clean Non-Metal, New Membrane
>Date: Fri, 6 May 2011 10:13:33 -0700
>From: emyers at snf.stanford.edu
>To: cmp-pcs at snf.stanford.edu
>
>Installed clean non-metal hardware set.  I replaced the membrane as 
>it had delaminated.  I found a lot of slurry under the membrane and 
>in the chuck hardware.  The last lab member should not been able to 
>chuck (in this case the membrane was flapping as I tried to inflate) 
>and probably saw slurry in the transparent lines leading to the 
>chuck hardware.  It appears we has a lab member not willing to 
>protect the hardware, which is unacceptable.