Problem drytek2 2001-07-14 13:46:09: Unstable (?) Plasma, Nitride Etch

mbartsch at mbartsch at
Sat Jul 14 01:46:11 PDT 2001

On my second time through a 20min single wafer Nitride etch, plasma repeatedly destabilized without warning - RF power dropped, reflected power increased to over 200, plasma at 4th electrode from top went dark.  Had to make significant changes to process 3 coil setting each time this happened to bring plasma back to its desired state.  Gas flows and pressure remained normal.  Very strange...  

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