Shutdown drytek2 2003-04-01 17:33:23: RF failure

hanjun at snf.stanford.edu hanjun at snf.stanford.edu
Tue Apr 1 05:33:24 PST 2003


I was trying to use "isotropic Si etch" program with process 1.
There was no RF plasma turned on, but only power values were displayed.
The reflected power value was displayed very high.
(forward=300/reflected=200)
The situation was the same for process 1 "contact clean". 




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