Problem drytek2 2004-01-27 18:35:20: Photoresist etches very fast in nitride recipe

yiching at snf.stanford.edu yiching at snf.stanford.edu
Tue Jan 27 18:35:20 PST 2004


Using the standard nitride recipe (SF6=53, F13=33), 3612 photoresist etches faster than nitride. Published etched rate is 450A/min, actual etch rate is > 700A/min. 2um resist is gone in less than 30min. Nitride etch rate seems right. 




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