From xzhuan1 at snf.stanford.edu Thu Jul 1 11:28:50 2004 From: xzhuan1 at snf.stanford.edu (xzhuan1 at snf.stanford.edu) Date: Thu, 1 Jul 2004 11:28:50 -0700 Subject: Problem drytek2 SNF 2004-07-01 11:28:49: can't start plasma on polyetch Message-ID: From xzhuan1 at snf.stanford.edu Thu Jul 1 11:33:32 2004 From: xzhuan1 at snf.stanford.edu (xzhuan1 at snf.stanford.edu) Date: Thu, 1 Jul 2004 11:33:32 -0700 Subject: Problem drytek2 SNF 2004-07-01 11:33:31: correction Message-ID: Problem was not with the plasma, but with the timer. It didn't work when I set the timer to 8 min, tried 10 min, it worked From eenriquez at snf.stanford.edu Thu Jul 1 13:48:25 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 1 Jul 2004 13:48:25 -0700 Subject: Problem drytek2 SNF 2004-07-01 11:33:31: correction Message-ID: From eenriquez at snf.stanford.edu Thu Jul 1 13:49:12 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 1 Jul 2004 13:49:12 -0700 Subject: Problem drytek2 SNF 2004-07-01 11:28:49: can't start plasma on polyetch Message-ID: Problem with the timer. User corrected the problem From jenwang at snf.stanford.edu Thu Jul 29 19:22:31 2004 From: jenwang at snf.stanford.edu (jenwang at snf.stanford.edu) Date: Thu, 29 Jul 2004 19:22:31 -0700 Subject: Problem drytek2 SNF 2004-07-29 19:22:31: Relatively high etch rate Message-ID: The etch rate at the second plate from the top is much higher than the other plates. The poly etch rate is 2600A/min but not 1600A/min in the process "poly etch" From eenriquez at snf.stanford.edu Fri Jul 30 08:48:13 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Fri, 30 Jul 2004 08:48:13 -0700 Subject: Comment drytek2 SNF 2004-07-30 08:48:07: High etch rate Message-ID: Ran an O2 clean for 45 min. Noticed the 2nd had less sparkles during the plasma clean. Nancy will check out the etch rate. From latta at snf.stanford.edu Fri Jul 30 15:02:23 2004 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Fri, 30 Jul 2004 15:02:23 -0700 Subject: Problem drytek2 SNF 2004-07-29 19:22:31: Relatively high etch rate Message-ID: Ran an electrode-to-electrode test; Poly program (117 SF6, 51 F22, 150mT, 400W) for 00:02:00. Results; Electrode # Etch Rate/min 1 1766 2 1850 3 1704 4 1552 5 1506 6 1796 Average of the electrodes is 1696A/min, not too far off of the 2003 data. Did not experience the high etchrate the user did. Will talk to them about their wafers. From latta at snf.stanford.edu Fri Jul 30 15:03:28 2004 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Fri, 30 Jul 2004 15:03:28 -0700 Subject: Comment drytek2 SNF 2004-07-30 08:48:07: High etch rate Message-ID: ER test done. System ok.