From eenriquez at snf.stanford.edu Mon Mar 1 09:50:43 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 1 Mar 2004 09:50:43 -0800 Subject: Comment drytek2 2004-02-06 15:44:53: reflected pwr high Message-ID: Cleaned chamber. Ran recipe 1 for 30 min. no problems. From eenriquez at snf.stanford.edu Mon Mar 1 09:51:27 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 1 Mar 2004 09:51:27 -0800 Subject: Problem drytek2 2004-02-29 10:19:39: Plasma unstable Message-ID: Cleaned chamber. Ran recipe 2, no problems From kenney at snf.stanford.edu Mon Mar 1 15:01:04 2004 From: kenney at snf.stanford.edu (kenney at snf.stanford.edu) Date: Mon, 1 Mar 2004 15:01:04 -0800 Subject: Problem drytek2 2004-03-01 15:01:03: Plate 3, plasma deignites Message-ID: From rfasch at snf.stanford.edu Mon Mar 1 17:09:33 2004 From: rfasch at snf.stanford.edu (rfasch at snf.stanford.edu) Date: Mon, 1 Mar 2004 17:09:33 -0800 Subject: Problem drytek2 2004-03-01 17:09:32: arcing Message-ID: all stages show plasma- but had arcing in O2 plasma --dirty chamber- run a long O2 clean. From cbaxter at snf.stanford.edu Mon Mar 1 18:58:57 2004 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 1 Mar 2004 18:58:57 -0800 Subject: Problem drytek2 2004-03-01 17:09:32: arcing Message-ID: run 30 mins o2 clean From cbaxter at snf.stanford.edu Mon Mar 1 19:00:59 2004 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 1 Mar 2004 19:00:59 -0800 Subject: Problem drytek2 2004-03-01 15:01:03: Plate 3, plasma deignites Message-ID: plasma is stable with o2 clean From yiching at snf.stanford.edu Mon Mar 1 19:28:17 2004 From: yiching at snf.stanford.edu (yiching at snf.stanford.edu) Date: Mon, 1 Mar 2004 19:28:17 -0800 Subject: Problem drytek2 2004-03-01 19:28:15: photoresist etches very fast in standard nitride program Message-ID: Recipe: SF6=53 F13=33 pressure=200mTorr RF=500W photoresist etches at ~650A/min, should be lower (450A/min) From cbaxter at snf.stanford.edu Mon Mar 1 20:55:10 2004 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 1 Mar 2004 20:55:10 -0800 Subject: Problem drytek2 2004-03-01 19:28:15: photoresist etches very fast in standard nitride program Message-ID: From kenney at snf.stanford.edu Tue Mar 2 11:47:05 2004 From: kenney at snf.stanford.edu (kenney at snf.stanford.edu) Date: Tue, 2 Mar 2004 11:47:05 -0800 Subject: Shutdown drytek2 2004-03-02 11:47:05: Lost plasma, screws glow orange! Message-ID: I ran a poly etch for about 20:00 and everything was perfect. I started a second poly etch and after about 3:00 the RF tuning became unstable. Within a minute I lost the plasma completely. I removed my wafers and started an O2 descum. There was no plasma and I noticed within seconds that the screws in the from of each plate with white rectangular insulators were glowing ORANGE! I shut the machine down as quickly as I could. From eenriquez at snf.stanford.edu Tue Mar 2 15:27:47 2004 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 2 Mar 2004 15:27:47 -0800 Subject: Shutdown drytek2 2004-03-02 11:47:05: Lost plasma, screws glow orange! Message-ID: Ran O2 plasma for 50 minutes.