From xzhuan1 at snf.stanford.edu Sat Jan 13 13:21:05 2007 From: xzhuan1 at snf.stanford.edu (xzhuan1 at snf.stanford.edu) Date: Sat, 13 Jan 2007 13:21:05 -0800 Subject: Problem drytek2 SNF 2007-01-13 13:21:05: 3rd plate doesn't have plasma Message-ID: when running prog2 poly etch. From ee410c at snf.stanford.edu Sat Jan 13 16:37:56 2007 From: ee410c at snf.stanford.edu (ee410c at snf.stanford.edu) Date: Sat, 13 Jan 2007 16:37:56 -0800 Subject: Comment drytek2 SNF 2007-01-13 16:37:50: RF reflected power too high Message-ID: The RF reflected power is about 340W and adjusting cap/coil does not work. - Dawson From eenriquez at snf.stanford.edu Tue Jan 16 08:10:34 2007 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 16 Jan 2007 08:10:34 -0800 Subject: Problem drytek2 SNF 2007-01-13 13:21:05: 3rd plate doesn't have plasma Message-ID: No problem tuning recipe #2. At 400 W forward power, the reflected power was 40 w. From eenriquez at snf.stanford.edu Tue Jan 16 08:10:53 2007 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 16 Jan 2007 08:10:53 -0800 Subject: Comment drytek2 SNF 2007-01-13 16:37:50: RF reflected power too high Message-ID: Tuned rf matching network. From bonner at snf.stanford.edu Tue Jan 23 14:36:23 2007 From: bonner at snf.stanford.edu (bonner at snf.stanford.edu) Date: Tue, 23 Jan 2007 14:36:23 -0800 Subject: Problem drytek2 SNF 2007-01-23 14:36:22: plasma extinguishes Message-ID: Third platen down from top self-extinguishes during run, matching network then requires adjustment From cbaxter at snf.stanford.edu Wed Jan 24 08:04:36 2007 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Wed, 24 Jan 2007 08:04:36 -0800 Subject: Problem drytek2 SNF 2007-01-23 14:36:22: plasma extinguishes Message-ID: Tighten rf strap on number#3 eletrode and run 25 mins o2 plasma w/out problem. From lindaw at snf.stanford.edu Wed Jan 24 14:13:23 2007 From: lindaw at snf.stanford.edu (lindaw at snf.stanford.edu) Date: Wed, 24 Jan 2007 14:13:23 -0800 Subject: Comment drytek2 SNF 2007-01-24 14:13:22: prgm 2 poly recipe reflected power drifting Message-ID: In program 2, running the poly etch recipe, the reflected power is not staying low. Normally it stays nice and steady once it is tuned. I found that it drifted from 0 to 100 W during the course of a 2 minute etch run. Very unusual. From fatihs at snf.stanford.edu Wed Jan 24 22:53:55 2007 From: fatihs at snf.stanford.edu (fatihs at snf.stanford.edu) Date: Wed, 24 Jan 2007 22:53:55 -0800 Subject: Problem drytek2 SNF 2007-01-24 22:53:55: One of the plates turns on and off during etching Message-ID: Third plate from the top turned off in the middle of etching, and that changed the power settings. Reflected power increased substantially. After 15 or 20 minutes it turned on again. From cbaxter at snf.stanford.edu Thu Jan 25 10:35:09 2007 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Thu, 25 Jan 2007 10:35:09 -0800 Subject: Problem drytek2 SNF 2007-01-24 22:53:55: One of the plates turns on and off during etching Message-ID: Lower electrode assembly and cleaned all rf straps on all 7 electrode. Run 30mins 100sccm O2 and 100sccm CF4 for 30mins @500watts rf power, did not encountered rf de-tuning.