Comment drytek2 SNF 2007-01-24 14:13:22: prgm 2 poly recipe reflected power drifting

lindaw at snf.stanford.edu lindaw at snf.stanford.edu
Wed Jan 24 14:13:23 PST 2007


In program 2, running the poly etch recipe, the reflected power is not staying low.  Normally it stays nice and steady once it is tuned. I found that it drifted from 0 to 100 W during the course of a 2 minute etch run.  Very unusual.




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