From dtschoen at snf.stanford.edu Tue Apr 1 14:40:42 2008 From: dtschoen at snf.stanford.edu (dtschoen at snf.stanford.edu) Date: Tue, 1 Apr 2008 14:40:42 -0700 Subject: Comment drytek2 SNF 2008-04-01 14:40:42: Very smelly Message-ID: Using Nitride etch. O2 with SF6. Bad sulfur smell when opening chamber. From eenriquez at snf.stanford.edu Wed Apr 2 11:39:47 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 2 Apr 2008 11:39:47 -0700 Subject: Comment drytek2 SNF 2008-04-01 14:40:42: Very smelly Message-ID: This is normal. Please wait a few minutes before purging the system. From eenriquez at snf.stanford.edu Wed Apr 2 13:22:53 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 2 Apr 2008 13:22:53 -0700 Subject: Problem drytek2 SNF 2008-03-31 21:16:14: Chiller was found off Message-ID: Thanks Robin. Mike D. will include this chiller in his daily rounds. From lindaw at snf.stanford.edu Mon Apr 7 11:44:29 2008 From: lindaw at snf.stanford.edu (lindaw at snf.stanford.edu) Date: Mon, 7 Apr 2008 11:44:29 -0700 Subject: Problem drytek2 SNF 2008-04-07 11:44:28: SF6 flow is unstable Message-ID: From eenriquez at snf.stanford.edu Mon Apr 7 14:15:23 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 7 Apr 2008 14:15:23 -0700 Subject: Comment drytek2 SNF 2008-04-07 14:15:23: Update Message-ID: Ran poly etch recipe (117 SF6, 51 F22, 400W RF) for 10 minutes with no problems. Will continue to monitor. From eenriquez at snf.stanford.edu Tue Apr 8 09:00:38 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 8 Apr 2008 09:00:38 -0700 Subject: Comment drytek2 SNF 2008-03-27 08:14:10: found system not in standby, power on, gases on. Message-ID: Noted From eenriquez at snf.stanford.edu Wed Apr 9 11:13:49 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 9 Apr 2008 11:13:49 -0700 Subject: Comment drytek2 SNF 2008-04-09 11:13:49: Completed monthly PM Message-ID: Ran poly etch recipe (uses SF6) for 10 minutes with no problems. SF6 flow was 117 +/- 1 sccm From eenriquez at snf.stanford.edu Wed Apr 9 11:14:25 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 9 Apr 2008 11:14:25 -0700 Subject: Problem drytek2 SNF 2008-04-07 11:44:28: SF6 flow is unstable Message-ID: Ran poly etch recipe (uses SF6) for 10 minutes with no problems. SF6 flow was 117 +/- 1 sccm From eenriquez at snf.stanford.edu Wed Apr 9 11:14:32 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 9 Apr 2008 11:14:32 -0700 Subject: Comment drytek2 SNF 2008-04-07 14:15:23: Update Message-ID: Ran poly etch recipe (uses SF6) for 10 minutes with no problems. SF6 flow was 117 +/- 1 sccm From eenriquez at snf.stanford.edu Wed Apr 9 11:14:48 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 9 Apr 2008 11:14:48 -0700 Subject: Comment drytek2 SNF 2008-03-28 13:34:26: Oiol change Message-ID: Noted