Comment drytek2 SNF 2009-01-09 11:06:13: Process Qual after RF repair

latta at snf.stanford.edu latta at snf.stanford.edu
Fri Jan 9 11:06:13 PST 2009


Poly Etch Recipe used, Si is poly layer- etch rates and selectivities are the average of all six electrodes.  Suggested that labmembers use electrodes 3 through 6 as 1 and 2 etch slower (#1) or faster (#2) than the others.  Full data available on request.
Poly ER = 1852A/min
PR ER = 312A/min
Th Ox ER = 143A/min
Sel SI : PR = 6 : 1
Sel Si : Ox = 13 : 1




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