Comment drytek2 SNF 2010-08-04 11:54:55: Poly etch rate

latta at snf.stanford.edu latta at snf.stanford.edu
Wed Aug 4 11:54:55 PDT 2010


After a labmember commented on the etch rate for the poly recipe I ran a wafer on electrode #1 for 2 mins after 10 mins of seasoning.  Flows for SF6 and F22 were steady, 401W, ref = 006W.
Etch rate = 2197A/mins
This is higher than the last time the rates were looked at; Jan 2010, 1730A/min.




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