Problem drytek2 SNF 2011-06-27 13:17:01: while running process 2 poly

eenriquez at snf.stanford.edu eenriquez at snf.stanford.edu
Fri Aug 19 13:02:32 PDT 2011

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Plasma is very stable now after the electrode rebuild.  Found heavy flaky on two of the RF feedtroughs inside the chamber.  Ran an oxide etch at 430 watts for 20 minutes with no problems.

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Next message: Comment drytek2 SNF 2011-07-19 12:35:00: Previous user could not get SF6 flow because
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