Problem drytek2 SNF 2011-07-21 13:28:38: etch rate very nonuniform across wafers and

lindaw at lindaw at
Thu Jul 21 13:28:39 PDT 2011

Etch rate very non-uniform across the wafers and from slot to slot.  Also tuning to maximize forward, minimize reflected, when set, will run normally, but then the plasma goes out, and retuning is required to spark the plasma again usually multiple turns of the coil from where it once was stable to where it resparks.  Then the next run will require retuning to the original settings to get plasma to spark.

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