Problem drytek2 SNF 2012-03-14 11:37:08: fail to run O2 etching

mzhang2 at snf.stanford.edu mzhang2 at snf.stanford.edu
Wed Mar 14 11:37:08 PDT 2012


even if the cap and coil numbers are turned properly during dummy run, when loading the wafer and using the same parameters, reverse power goes immediately above the scale after the plasma is on




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