Drytek2 status 8/14/00

Jim McVittie mcvittie at cis.Stanford.EDU
Mon Aug 14 16:50:19 PDT 2000


Ammtetcher Users,

With Drytek2 being down, I suggest that you use the Matrix for your post
oxide etch cleanup before your H2SO4/H2O2 wet resist strip. I have found
that the first 15 seconds of the standard Matrix process is sufficent to
make the H2SO4/H2O2 strip work correctly. I usually just run the standard
process in the single wafer mode and use the abort bottom to stop after
the 15s initiation period. 

			Jim 	
--------------------------------------------------------------
James P. McVittie, Ph.D.                Senior Research Scientist
Rm. 336            			jmcvittie at stanford.edu
Allen Center for Integrated Systems	Tel: (650) 725-3640	
Stanford University			Fax: (650) 723-4659
330 Serra Mall		  For packages: CISX Receiving
Stanford, CA 94305-4075			Via Ortega
					Stanford, CA 94305-4075

On Mon, 14 Aug 2000, Len Booth wrote:

> Users -
> 	The electrode chiller is not working at all.
> The machine will be shutdown until we get it fixed.
> 			Len
> 




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