From shott at stanford.edu Wed Jan 7 18:59:57 2009 From: shott at stanford.edu (John Shott) Date: Wed, 07 Jan 2009 18:59:57 -0800 Subject: Drytek2 update .... limited success. Message-ID: <49656C2D.5020006@stanford.edu> Drytek2 Fans: I know that the drytek2 has been ailing for some time. I can report limited success in terms of addressing the low, drifting RF power. For some time people have seen a maximum power of from 300-400 watts .... and that power tends to drift over time. While we have not been able to restore the full 1000 watts that this supply is supposed to be able to generate, we have at least been able to find enough minor problems that it will now generate and control powers of 500W. I just ran a 30 minute oxygen plasma and it was able to generate and control 500W of forward power during the entire time. While it doesn't have great margin above 500 watts .... maybe only 525 or 550 after it heats up .... I think that is both better than it was and likely usable for a greater fraction of the drytek community. While we didn't find any one major problem .... and still haven't really found out what is preventing it from generating full output power .... we did find and fix several minor things that were contributing to the limited power problem including aging electrolytic capacitors on the +12 and +40 VDC supplies, an undersized (wattage-wise) emitter degeneration resistor in the RF oscillator, and a couple of marginal components in the gain control stage. After consulting with Jim McVittie, I also made an initial attempt to address the RF tuning problem .... where we don't every get a great null in the reflected power and only approach tune at minimum coil and maximum capacitance. I'm sorry to report that my initial efforts this afternoon didn't result in any significant improvement in that situation. As a result, I'll try to spend more time with Jim to see where either my understanding or my approach failed to produce results. While waiting to better resolve the tuning issues, however, I believe that we have at least improved the RF power situation for those of you needing to run at 500 watts. As a result, I believe that many of you may cautiously begin to use this tool again and I'll hope that Nancy can do some etch rate runs tomorrow at 500 watts RF power to double check etch rates for standard recipes and conditions. We'll hope to have resolved the remaining tuning issues in the near future. I personally apologize to all of your for the extended delays in getting this tool fully operational and take full responsibility for those delays. Please report your experiences or problems when using this tool. Thank you for your continued support, John From shott at stanford.edu Wed Jan 21 16:31:14 2009 From: shott at stanford.edu (John D Shott) Date: Wed, 21 Jan 2009 16:31:14 -0800 (PST) Subject: Improvements to RF tuning .... In-Reply-To: <242297072.1699421232584210317.JavaMail.root@zm07.stanford.edu> Message-ID: <1687909719.1699571232584274547.JavaMail.root@zm07.stanford.edu> Drytek2 community: Today, based on some recommendations from Jim McVittie, Team Drytek made some changes to the RF matching network. Following these changes, we have now been able to see a nice minimum in the reflected RF power. With a forward power of 425 watts, we were able to consistently tune to a reflected power of 20 watts or less .... and not be at the extremes of either the coil or the capacitor. For Process 1 running the oxygen plasma recipe, I found optimum tuning at a coil setting of 1.60 (out of 10) and at a coil setting of about 2.2 (also out of 10). Previously, "near tune" was occurring at a coil setting of zero and a capacitor setting of about 10. It would be a help to others if people would record the coil and cap settings for different recipes (and when run in process 1, 2 and 3). I am hopeful that this will at least result in better tuning performance on this tool .... and will now turn my attention back to the problem of consistently achieving higher power settings. Please let us know if you encounter any serious tuning problems and we will do our best to address them. Happy processing, John