From nlatta at stanford.edu Fri Sep 2 11:10:22 2011 From: nlatta at stanford.edu (Nancy Latta) Date: Fri, 02 Sep 2011 11:10:22 -0700 Subject: New Power Supply- New Instructions Message-ID: <4E611C0E.4040703@stanford.edu> Folks, After many hours of work and head scratching Jim McVittie has installed a new RF power supply that will go to full power and tune nicely. There are, however, new instructions for turning on and tuning the power supply. Please see below. The instructions will be posted on the etcher and noted in the operation instructions at the tool. This may be a temporary state as we may be ordering a newer more powerful RF power supply. Turn on POWER on the RF power supply. The following buttons should be on; FORWARD POWER REMOTE CONTROL REMOTE SIGNAL The following buttons should be off; RIGHT DISPLAY LEFT DISPLAY SETPOINT When the plasma is on RF ON should be lit. When the plasma is off RF should be lit. Tuning; Adjust the coil pot only. Use the bird meter (located above the tuning pots). Make sure the arrow is pointing left. The old black box on the loading station may be used for gross tuning. The most accurate froward and reverse power readings are on the power supply itself. Write down the numbers on the coil and cap pots so that you can get close to perfect tuning the next time you use the etcher. -Team Etch From nlatta at stanford.edu Thu Sep 8 14:40:23 2011 From: nlatta at stanford.edu (Nancy Latta) Date: Thu, 08 Sep 2011 14:40:23 -0700 Subject: New Operating Instructions for Drytek2 Message-ID: <4E693647.9090504@stanford.edu> Attention: Before you use drytek2 please read the new operating instructions located in the blue book.They contain a new, as of 9/8/2011, RF tuning procedure.The changes have been underlined to highlight them. You will notice that the old RF power supply is back.At this time it will not go any higher than 400W.Expect etch rates to have decreased. A new power supply is on order so drytek2 should be able to deliver 500 total watts.We will let you know when it has been installed.The new tuning procedure will remain in place. In addition, there is a new log form for you to fill out at the end of the etch.You will be asked for the coil and cap settings.They can be found by looking on the coil and cap tuning pots (the black knobs used to tune the RF).We want to collect this information so that users of the tool can refer back to the last settings used for a given recipe and plug them in to ease the RF tuning procedure. Lastly, we are requiring the labmembers turn the RF power level to zero after using the tool.This will limit wear and tear on the RF power supply.We also ask that users tune the RF at a much lower power (40W) before turning the RF to the full power desired.This procedure is covered in the new operating instructions. Team Etch -------------- next part -------------- An HTML attachment was scrubbed... URL: From jasonlin at stanford.edu Thu Sep 22 19:41:37 2011 From: jasonlin at stanford.edu (J. Jason Lin) Date: Thu, 22 Sep 2011 19:41:37 -0700 Subject: Drytek2 free now and Friday 1-3pm Message-ID: -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Tue Sep 27 18:07:41 2011 From: mtang at stanford.edu (Mary Tang) Date: Tue, 27 Sep 2011 18:07:41 -0700 Subject: One less drytek.... Message-ID: <4E82735D.6080108@stanford.edu> Dear drytek1/2 users -- Drytek1, sadly, is no longer with us. Within the next few days, its former location will be taken by a new Oxford III-V etcher. Drytek2 users, please be prepared to share the machine with former drytek1 users. This will be in effect starting in the morning on Wednesday, Sept. 28. Of the 6 electrodes, the top four will remain dedicated for clean/semiclean processing and the bottom two will be dedicated for gold-compatible processing. Make sure to observe good lab practices and don't mix electrodes with incompatible materials. Drytek1 users who are not already qualified on drytek2 will need a brief retraining. Please contact Nancy for arrangements. Drytek2 users: yes, I'm afraid you lose two electrodes -- but the lab also gains the first of several new etchers. Please check Coral or the Wiki for qual data to be posted soon. Thanks for your patience -- and please do let us know your concerns. Team Etch -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu