From eenriquez at snf.stanford.edu Mon Mar 3 14:55:44 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 3 Mar 2008 14:55:44 -0800 Subject: Comment drytek4 SNF 2008-03-03 14:55:43: Update Message-ID: Matching installed. Ran O2 clean with no problems. Found the platten cooling water is too low. Will try to flush out the lines tomorrow. From eenriquez at snf.stanford.edu Tue Mar 4 08:15:57 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:15:57 -0800 Subject: Shutdown drytek4 SNF 2008-02-19 11:41:18: RF down Message-ID: Jim M repaired the matching network. He found several poor electrical connections. From eenriquez at snf.stanford.edu Tue Mar 4 08:16:04 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:16:04 -0800 Subject: Problem drytek4 SNF 2008-02-15 21:51:34: RF reflected power is high Message-ID: Jim M repaired the matching network. He found several poor electrical connections. From eenriquez at snf.stanford.edu Tue Mar 4 08:16:39 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:16:39 -0800 Subject: Comment drytek4 SNF 2008-02-20 18:58:24: Update Message-ID: Jim M repaired the matching network. He found several poor electrical connections. From eenriquez at snf.stanford.edu Tue Mar 4 08:16:52 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:16:52 -0800 Subject: Comment drytek4 SNF 2008-02-27 19:17:56: Update Message-ID: Jim M repaired the matching network. He found several poor electrical connections. From eenriquez at snf.stanford.edu Tue Mar 4 08:18:50 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:18:50 -0800 Subject: Comment drytek4 SNF 2008-03-03 14:55:43: Update Message-ID: Flushed out the platten cooling water lines. Now flow is at 0.2 gpm. From eenriquez at snf.stanford.edu Tue Mar 4 08:19:09 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Mar 2008 08:19:09 -0800 Subject: Comment drytek4 SNF 2008-02-05 14:48:23: o2 valve Message-ID: Noted From jperez at snf.stanford.edu Tue Mar 4 10:27:15 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Tue, 4 Mar 2008 10:27:15 -0800 Subject: Problem drytek4 SNF 2008-03-04 10:27:14: Issues with all three processes, read below Message-ID: Cleaned chamber for 40 minutes. Checked chamber pressure zero setting, Stable after at +0006 Start button light is out 1-Process one; A - O2 gas flow (actual) dropped down to 64.6 and sat. Should be about 97/99. 2- Process two; A -Struggled to reach less than 5 watts (reflective power) B - O2 gas flow (actual) stable at 92 (flow setting all maxed out 3 - Process three A - could not get RF to tune, didn't try long due to acring From druist at snf.stanford.edu Tue Mar 4 14:53:12 2008 From: druist at snf.stanford.edu (druist at snf.stanford.edu) Date: Tue, 4 Mar 2008 14:53:12 -0800 Subject: Problem drytek4 SNF 2008-03-04 14:53:12: O2 etch rate shifted>50% Message-ID: we normally run 1050 or 75 W with 100 mtorr, 100% CHF3, 35% O2 flow to etch resist and oxide at about the same rate. After tool is back up, resist etch rate has increased >50%, and we need to decrease O2 flow to ~15% to get the resist/oxide rates the same. If etch rate with O2 is crucial for your process, run a test wafer to characterize the rate 1st. Jeannie will have maintanace look at the tool Wednesday. From jperez at snf.stanford.edu Tue Mar 4 15:33:41 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Tue, 4 Mar 2008 15:33:41 -0800 Subject: Shutdown drytek4 SNF 2008-03-04 15:33:41: Removing more than before for Users Message-ID: Unstable O2 and when O2 setpoint is dropped and flow is stable, User experienced 50% faster resist removal. Couldn/t get his etch process to stable. Need maintenance to work on system. Jim McVitte thinks it may not be ground properly.. User used process 2. From jperez at snf.stanford.edu Tue Mar 4 17:07:59 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Tue, 4 Mar 2008 17:07:59 -0800 Subject: Shutdown drytek4 SNF 2008-03-04 15:33:41: Removing more than before for Users Message-ID: Jim McVitte adjusted some grounding areas and Jim Kruger will test system. From jimkruger at snf.stanford.edu Tue Mar 4 18:18:37 2008 From: jimkruger at snf.stanford.edu (jimkruger at snf.stanford.edu) Date: Tue, 4 Mar 2008 18:18:37 -0800 Subject: Comment drytek4 SNF 2008-03-04 18:18:36: RF grounding temporary patch improves O2 stability Message-ID: Al foil patch improves O2 flow sensitivity to RF. Should be OK to use until permanent RF ground fix. jim k From jperez at snf.stanford.edu Mon Mar 10 11:08:12 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Mon, 10 Mar 2008 11:08:12 -0700 Subject: Problem drytek4 SNF 2008-03-10 11:08:08: Lower electrode water low. Message-ID: User has it until 1PM.3/10/08 From mdickey at snf.stanford.edu Mon Mar 10 13:39:09 2008 From: mdickey at snf.stanford.edu (mdickey at snf.stanford.edu) Date: Mon, 10 Mar 2008 13:39:09 -0700 Subject: Problem drytek4 SNF 2008-03-10 11:08:08: Lower electrode water low. Message-ID: Flow is back up after blowing out lines From eenriquez at snf.stanford.edu Thu Mar 13 11:05:25 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 13 Mar 2008 11:05:25 -0700 Subject: Problem drytek4 SNF 2008-03-04 14:53:12: O2 etch rate shifted>50% Message-ID: Installed copper mesh rf shielding. Ran O2 clean for 10 minutes. O2 flow is very stable. From eenriquez at snf.stanford.edu Thu Mar 13 11:05:33 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 13 Mar 2008 11:05:33 -0700 Subject: Comment drytek4 SNF 2008-03-04 18:18:36: RF grounding temporary patch improves O2 stability Message-ID: Installed copper mesh rf shielding. Ran O2 clean for 10 minutes. O2 flow is very stable. From eenriquez at snf.stanford.edu Thu Mar 13 11:05:43 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 13 Mar 2008 11:05:43 -0700 Subject: Problem drytek4 SNF 2008-03-04 10:27:14: Issues with all three processes, read below Message-ID: Installed copper mesh rf shielding. Ran O2 clean for 10 minutes. O2 flow is very stable. From eenriquez at snf.stanford.edu Thu Mar 13 11:06:06 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 13 Mar 2008 11:06:06 -0700 Subject: Comment drytek4 SNF 2008-01-28 14:44:22: Standby light is out, please down walk away Message-ID: Replaced the Standby light bulb. From jperez at snf.stanford.edu Fri Mar 14 15:28:00 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Fri, 14 Mar 2008 15:28:00 -0700 Subject: Shutdown drytek4 SNF 2008-03-14 15:28:00: RF Power supply making a popping noise Message-ID: Couldn't get reflective power down below 5 watts. The more I tried, the worse it got. From eenriquez at snf.stanford.edu Mon Mar 17 10:26:59 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 17 Mar 2008 10:26:59 -0700 Subject: Comment drytek4 SNF 2008-03-17 10:26:58: Update Message-ID: Matching network coupling is loose. Program 1 button does not start the process. From jperez at snf.stanford.edu Wed Mar 19 07:27:09 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Wed, 19 Mar 2008 07:27:09 -0700 Subject: Problem drytek4 SNF 2008-03-19 07:27:08: Start button does NOT stay on when pressed Message-ID: From jperez at snf.stanford.edu Mon Mar 24 09:25:40 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Mon, 24 Mar 2008 09:25:40 -0700 Subject: Comment drytek4 SNF 2008-03-24 09:25:39: Up-date Message-ID: Jim McVitte waiting for parts that are on order. From uezn at 65-112-149-45.neotechus.com Thu Mar 27 05:15:26 2008 From: uezn at 65-112-149-45.neotechus.com (Wecdc) Date: Thu, 27 Mar 2008 20:15:26 +0800 Subject: =?GB2312?B?0rvVviC5usbryr0=?= Message-ID: <200803270815718.SM00888@stewldi> An HTML attachment was scrubbed... URL: