From eenriquez at snf.stanford.edu Tue Aug 3 13:15:31 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 3 Aug 2010 13:15:31 -0700 Subject: Comment drytek4 SNF 2010-07-29 11:36:46: Tested OK after power outtage Message-ID: Archived From ahazeghi at snf.stanford.edu Mon Aug 9 21:28:29 2010 From: ahazeghi at snf.stanford.edu (ahazeghi at snf.stanford.edu) Date: Mon, 9 Aug 2010 21:28:29 -0700 Subject: Problem drytek4 SNF 2010-08-09 21:28:28: problem with power supply Message-ID: unstable power, flikering plasma, arching From cbaxter at snf.stanford.edu Tue Aug 10 09:10:50 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Tue, 10 Aug 2010 09:10:50 -0700 Subject: Problem drytek4 SNF 2010-08-09 21:28:28: problem with power supply Message-ID: Was able to tuned using nitride and o2 clean recipes w/out problem, with 150 watts forward power and with less than 5 watts reflective. From jparker at snf.stanford.edu Sat Aug 14 10:48:07 2010 From: jparker at snf.stanford.edu (jparker at snf.stanford.edu) Date: Sat, 14 Aug 2010 10:48:07 -0700 Subject: Problem drytek4 SNF 2010-08-14 10:48:06: leak to pressure gauge? Message-ID: Pressure gauge reading drifts up at 100s of mtorr/sec after a process is done as you're waiting to change wafers. It does not seem to stop. It is fine during a process, though, and seemed to be fine when I took it out of standby. Caveat: I have not used drytek4 in a while and this may be normal behavior. From jparker at snf.stanford.edu Sat Aug 14 10:54:52 2010 From: jparker at snf.stanford.edu (jparker at snf.stanford.edu) Date: Sat, 14 Aug 2010 10:54:52 -0700 Subject: Comment drytek4 SNF 2010-08-14 10:54:51: Addendum (typo) Message-ID: Correcting a typo in my reported problem: there is 1 extra zero in my last comment (I meant 10s of mtorr/sec leak). The reading can read the 1000s of mtorr if you are not quick changing your wafers. From cbaxter at snf.stanford.edu Mon Aug 16 08:23:04 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 16 Aug 2010 08:23:04 -0700 Subject: Problem drytek4 SNF 2010-08-14 10:48:06: leak to pressure gauge? Message-ID: From eenriquez at snf.stanford.edu Mon Aug 16 09:44:55 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 16 Aug 2010 09:44:55 -0700 Subject: Comment drytek4 SNF 2010-08-16 09:44:54: Update leak to gauge Message-ID: The manometer isolation valve has a leak which causes the manometer to slowly vent to atmosphere whenever the chamber is vented. This leak will not affect the process. We have ordered a replacement valve and will replace it when it arrives. From bryane at snf.stanford.edu Fri Aug 20 17:34:28 2010 From: bryane at snf.stanford.edu (bryane at snf.stanford.edu) Date: Fri, 20 Aug 2010 17:34:28 -0700 Subject: Shutdown drytek4 SNF 2010-08-20 17:34:27: no plasma Message-ID: The system worked fine for a few etches, then suddenly the reflected power jumped up, and I could no longer get a plasma. Tuning the coil and capacitor doesn't seem to have any effect on the reflected power. Sorry to shut down the system right before the weekend. From cbaxter at snf.stanford.edu Mon Aug 23 09:43:43 2010 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Mon, 23 Aug 2010 09:43:43 -0700 Subject: Shutdown drytek4 SNF 2010-08-20 17:34:27: no plasma Message-ID: The coupler came off inside the matching network. Re-connected coupler and tested rf using O2 and SF6 gases. From faridz at snf.stanford.edu Mon Aug 23 11:06:37 2010 From: faridz at snf.stanford.edu (faridz at snf.stanford.edu) Date: Mon, 23 Aug 2010 11:06:37 -0700 Subject: Problem drytek4 SNF 2010-08-23 11:06:36: RF problem at Process 3 Message-ID: unable to trune on RF at Process 3. From eenriquez at snf.stanford.edu Tue Aug 24 14:50:37 2010 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 24 Aug 2010 14:50:37 -0700 Subject: Problem drytek4 SNF 2010-08-23 11:06:36: RF problem at Process 3 Message-ID: No problem found. Was able to tune plasma within 5 sec.