Comment drytek4 SNF 2012-02-09 11:51:05: Test Qual was GOOD

jperez at snf.stanford.edu jperez at snf.stanford.edu
Thu Feb 9 11:51:06 PST 2012


Ran two test wafers, one with a thicker thermal oxide for four minutes and a thinner thermal oxide for two minutes.
Results were'
4 min etch 228A/min.
2min etch  222A/min.




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