From nperez at stanford.edu  Thu Nov 29 13:53:04 2012
From: nperez at stanford.edu (Jeannie Perez)
Date: Thu, 29 Nov 2012 13:53:04 -0800
Subject: FYI on ER from STS through Drytek4
Message-ID: <50B7D940.7080804@stanford.edu>

High Frequency Oxide test wafer from STS PECVD was etch in Drytek 4 with 
parameters:
  150 Watts,
  100 mT,
100 % CHF3,
10% O2
1min etch with results of 217A/min.

Jeannie