Comment epi2 SNF 2007-02-13 15:40:10: H2 anneal optimization

maurice at snf.stanford.edu maurice at snf.stanford.edu
Tue Feb 13 15:40:11 PST 2007


Rishi has successfully done silicon feature smoothing using H2 at 1100c for 10min with H2 flow at 20 L/min.
He will continue to characterize and optimize the anneal process.




More information about the epi2-pcs mailing list