Comment epi2 SNF 2009-06-26 16:12:14: wafer inspection

ryw at snf.stanford.edu ryw at snf.stanford.edu
Fri Jun 26 16:12:15 PDT 2009


run the same receipe for 8 wafers, first 4 are good, with minimum haze and particle, last 4 have a lot of haze and particle. Very possible that the Ge etch coat program is not long enough to clean the chamber during every run.




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