Problem epi2 SNF 2011-09-25 11:44:19: HCL flow deviation during the Ge etch coat.

[dongrip at snf.stanford.edu]

When running Ge etch coat, HCL flow deviation (6~8%) error occurred. Specifically, when reaching to the 980 sccm target value of HCL during the cleaning, it happens due to slowly reaching the target value. This sometimes happens, but sometimes not.