Problem epi2 SNF 2011-09-25 11:44:19: HCL flow deviation during the Ge etch coat.

dongrip at snf.stanford.edu dongrip at snf.stanford.edu
Sun Sep 25 11:44:20 PDT 2011


When running Ge etch coat, HCL flow deviation (6~8%) error occurred. Specifically, when reaching to the 980 sccm target value of HCL during the cleaning, it happens due to slowly reaching the target value. This sometimes happens, but sometimes not.




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