Problem epi2 SNF 2012-04-12 22:21:26: HCl flow deviation

junam at snf.stanford.edu junam at snf.stanford.edu
Thu Apr 12 22:21:27 PDT 2012


GE ETCH COAT:: was used for chamber cleaning.
During the recipe run, on step 8: Bake (Lower PID 1100 oC and HCL setpoint 800), HCL flow could not reach the set point (800), and flow read deviated under 40 sccm. Process was aborted due to the HCl flow deviation.




More information about the epi2-pcs mailing list