Comment epi2 SNF 2012-04-18 15:35:55: Ge etch program modified

maurice at snf.stanford.edu maurice at snf.stanford.edu
Wed Apr 18 15:35:55 PDT 2012


Step 7 time reduced from 120 sec to 100sec
Step 7 time reduced from 120 sec to 100sec
Step 8 temp reduced from 1100c to 950c
Program is now running without waferflow/contactor error




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