From maurice at stanford.edu  Mon Feb  2 11:43:10 2009
From: maurice at stanford.edu (Maurice Stevens)
Date: Mon, 02 Feb 2009 11:43:10 -0800
Subject: Epi2 free until 6:00pm
Message-ID: <49874CCE.6040903@stanford.edu>




From maurice at stanford.edu  Fri Feb 20 09:18:26 2009
From: maurice at stanford.edu (maurice stevens)
Date: Fri, 20 Feb 2009 09:18:26 -0800
Subject: [Fwd: Ge test]
Message-ID: <499EE5E2.3090004@stanford.edu>

Thank you Szu-Lin, Serene and Shyam (all "S" names...kind of strage) for 
you time and the update.

-m

-------- Original Message --------
Subject: 	Ge test
Date: 	Thu, 19 Feb 2009 23:19:12 -0800
From: 	Szu-Lin Cheng <slcheng at stanford.edu>
To: 	<maurice at stanford.edu>, "'Serene Koh'" <hweiyin at stanford.edu>



 

 

The 3 test wafers done by Serene tonight all have small dots on top.

The good news is the 4^th one I did with full annealing time is much better.

Therefore, I am going to do some test on this one tomorrow.

In my point of view, the machine condition is OK.

Probably only need another 2 test wafers.

Cheers

 

Szulin


-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278



From grahamab at stanford.edu  Sat Feb 21 11:07:42 2009
From: grahamab at stanford.edu (Andrew Blake Graham)
Date: Sat, 21 Feb 2009 11:07:42 -0800 (PST)
Subject: cancelled epi2 reservation today
Message-ID: <1499115850.1266721235243262214.JavaMail.root@zm06.stanford.edu>

Sorry for the very late notice but some other testing is running long.  


From maurice at stanford.edu  Wed Feb 25 09:31:53 2009
From: maurice at stanford.edu (maurice stevens)
Date: Wed, 25 Feb 2009 09:31:53 -0800
Subject: Problem epi2 SNF 2009-02-24 23:42:40: Many large particles...
In-Reply-To: <20090225074241.2F5783B7D0B@smtp5.stanford.edu>
References: <20090225074241.2F5783B7D0B@smtp5.stanford.edu>
Message-ID: <49A58089.4070605@stanford.edu>

Hi Raja,

Szu-Lin reported the same thing.  When we looked at his wafers 
yesterday, we noticed that the particles here sitting on top.  They were 
not embedded in the layer.  They were easily moved and removed with 
tweezers.  We didn't try blowing them off but it seemed like they would.

Since the particles are coming off so easily they have to be getting on 
the wafer after the growth step.  Elmer suggested that we load wafers in 
and out of the system without a growth to see if wafers are coming from 
the unloading.  I have reserve the system for a couple of hours tomorrow.

Could you look at your wafers and see if your particles are similar to 
Szu-Lin's?

-m

jrjain at snf.stanford.edu wrote:
> ..for MHAH Ge epitaxy with both 3 layers and 5 layers.  There are large particles across all four wafers that were processed.
>
>   

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278



From jrjain at stanford.edu  Wed Feb 25 12:57:20 2009
From: jrjain at stanford.edu (Raja Jain)
Date: Wed, 25 Feb 2009 12:57:20 -0800
Subject: Problem epi2 SNF 2009-02-24 23:42:40: Many large particles...
In-Reply-To: <49A58089.4070605@stanford.edu>
References: <20090225074241.2F5783B7D0B@smtp5.stanford.edu> <49A58089.4070605@stanford.edu>
Message-ID: <000601c9978b$a6bd9360$f438ba20$@edu>

Hey Maurice,

I actually put those epi wafers through the spin dryer yesterday night.  One
of the four came out cleaner, while the others remained "dirty" with
particles.  N2 blow drying on those three didn't help further.

Elmer's suggestion is a good one.  The particles could ostensibly be coming
from the transfer chamber, Chambers A/F, or LLA, so we might want to send a
few wafers through each of those places to be sure of the source.

Thanks,
Raja





-----Original Message-----
From: maurice stevens [mailto:maurice at stanford.edu] 
Sent: Wednesday, February 25, 2009 9:32 AM
To: jrjain at snf.stanford.edu; epi2 at snf.stanford.edu
Subject: Re: Problem epi2 SNF 2009-02-24 23:42:40: Many large particles...

Hi Raja,

Szu-Lin reported the same thing.  When we looked at his wafers 
yesterday, we noticed that the particles here sitting on top.  They were 
not embedded in the layer.  They were easily moved and removed with 
tweezers.  We didn't try blowing them off but it seemed like they would.

Since the particles are coming off so easily they have to be getting on 
the wafer after the growth step.  Elmer suggested that we load wafers in 
and out of the system without a growth to see if wafers are coming from 
the unloading.  I have reserve the system for a couple of hours tomorrow.

Could you look at your wafers and see if your particles are similar to 
Szu-Lin's?

-m

jrjain at snf.stanford.edu wrote:
> ..for MHAH Ge epitaxy with both 3 layers and 5 layers.  There are large
particles across all four wafers that were processed.
>
>   

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278